Hostname: page-component-76fb5796d-r6qrq Total loading time: 0 Render date: 2024-04-30T01:47:14.669Z Has data issue: false hasContentIssue false
  • English
  • Français

Material Aspects of Reactively MF-Sputtered Zinc Oxide for TCO Application in Silicon Thin Film Solar Cells

Published online by Cambridge University Press:  01 February 2011

Jürgen Hüpkes ,
Bernd Rech ,
Oliver Kluth ,
Joachim Müller ,
Hilde Siekmann ,
Chitra Agashe ,
Hans P. Bochem  and
Matthias Wuttig
Jürgen Hüpkes
Affiliation:
Institute of Photovoltaics (IPV), Forschungszentrum Jülich GmbH, D-52425 Jülich
Bernd Rech
Affiliation:
Institute of Photovoltaics (IPV), Forschungszentrum Jülich GmbH, D-52425 Jülich
Oliver Kluth
Affiliation:
Institute of Photovoltaics (IPV), Forschungszentrum Jülich GmbH, D-52425 Jülich
Joachim Müller
Affiliation:
Institute of Photovoltaics (IPV), Forschungszentrum Jülich GmbH, D-52425 Jülich
Hilde Siekmann
Affiliation:
Institute of Photovoltaics (IPV), Forschungszentrum Jülich GmbH, D-52425 Jülich
Chitra Agashe
Affiliation:
Institute of Photovoltaics (IPV), Forschungszentrum Jülich GmbH, D-52425 Jülich
Hans P. Bochem
Affiliation:
Institute of Thin Films and Interfaces (ISG), Forschungszentrum Jülich GmbH, D-52425 Jülich
Matthias Wuttig
Affiliation:
Institute for Physics of New Materials - Department of Physics, RWTH, D-52056 Aachen
Get access

Abstract

Al-doped ZnO films were deposited on glass in an in-line system by reactive mid-frequency (MF) magnetron sputtering. The influence of substrate position on the film properties as well as the relation between static and dynamic deposition are studied. All films showed low resistivity (<4x10-4 Ωcm) and excellent transparency (> 80 % in the visible region). The resistivity ρ for substrate positions above the sputter craters (race tracks) is up to a factor of two higher than on other positions where the smallest ρ is 1.9 x 10-4 Ωcm. Major differences in statically deposited films as a function of the position on the substrate are found for the structural film properties as characterized by x-ray diffraction (XRD) and etching behaviour. The different surface textures obtained after etching are directly related to variations in the short-circuit current densities of amorphous silicon p-i-n solar cells prepared on these etched ZnO:Al films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 762: Symposium A – Amorphous and Nanocrystalline Silicon-Based Films – 2003 , 2003 , A7.11
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Müller, J., Schöpe, G., Kluth, O., Rech, B., Ruske, M., Trube, J., Szyszka, B., Jiang, X., and Bräuer, G., Thin Solid Films 392 327–333 (2001)Google Scholar
2. , Löffl, Wieder, S., Rech, B., Kluth, O., Beneking, C., and Wagner, H., Proceedings of the 14th European Solar Energy Conference, Barcelona p. 2089 (1997)Google Scholar
3. Szyszka, B., Thin Solid Films 351, 164–169 (1999)Google Scholar
4. Müller, J., Schöpe, G., Kluth, O., Rech, B., Sittinger, V., Szyszka, B., Geyer, R., Lechner, P., Schade, H., Ruske, M., Dittmar, G., Bochem, H. P., Proc. 4th Int. Conf. on Coatings on Glass, pp.505–512 (2002)Google Scholar
5. Hong, R.J., Jiang, X., Szyszka, B., Sittinger, V., Xu, S.H., Werner, W., and Heide, G., Jornal of Crystal Growth, In Press, Corrected Proof (2003)Google Scholar
6. Strümpfel, J., Beister, G., Schulze, D., Kammer, M., Rehn, S., 40th Annual Technical Conference of the Society of Vacuum Coaters, New Orleans USA, April 12-17, (1997)Google Scholar
7. Ellmer, K., J. Phys. D: Appl. Phys. 34, 3097–3108 (2001)Google Scholar
8. Tu, K.N., and Rosenberg, R., academic press inc. ISBN 0-12-341827-5Google Scholar
9. Kappertz, O., Drese, R., and Wuttig, M., J. Vac. Sci. Technol. A 20 (6), (Nov/Dec 2002)Google Scholar
10. Sato, H., Minami, T., Takata, S., Mouri, T., and Ogawa, N., Thin Solid Films, 220 327–332 (1992)Google Scholar
11.JCPDS card 80-0075Google Scholar
12. Rech, B., Müller, J., Repmann, T., Kluth, O., Roschek, T., Hüpkes, J., Stiebig, H., and Appenzeller, W., MRS Spring meeting, San Francisco 2003 Google Scholar
13. Thornton, J. A., J. Vac. Sci Technol. 11, 666 (1974)Google Scholar
14. Kluth, O., Schöpe, G., Hüpkes, J., Agashe, C., Müller, J., Rech, B., Proc. 4th Int. Conf. on Coatings on Glass, Braunschweig, Germany (2002) p. 299; accepted for publication in Thin Solid FilmsGoogle Scholar
15. Tominaga, K., Kuroda, K., and Toda, O., Jap. J. Appl. Phys. 27, 1176 (1988)Google Scholar
16. Minami, T., Nanto, H., Sato, H., and Takata, S., Thin Slid Films, 164 275–279 (1988)Google Scholar
17. Song, D., Widenborg, P., Chin, W., and Aberle, A. G., Solar Energy Materials & Solar Cells 73 1–20 (2002)Google Scholar
18. Minami, T., Miyata, T., Yamamoto, T. and Toda, H., J. Vac. Sci. Technol. A 18 (4) (Jul/Aug 2000)Google Scholar
19. Webb, J. B., Thin Solid Films 136 135–139 (1986)Google Scholar