Hostname: page-component-76dd75c94c-lntk7 Total loading time: 0 Render date: 2024-04-30T07:15:31.450Z Has data issue: false hasContentIssue false

Microstructure of In-Situ Grown YBa2Cu4O8 Thin Films Deposited by MOCVD

Published online by Cambridge University Press:  26 February 2011

K. Uehara
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10–13 Shinonome 1-chome, Koto-ku. Tokyo 135., Japan
H. Sakai
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10–13 Shinonome 1-chome, Koto-ku. Tokyo 135., Japan
H. Hayashi
Affiliation:
Central Research Laboratory, Kyocera Corporation, 1–4 Yamashita-cho, Kokubu-shi, Kagoshima 899–43, Japan
Y. Shiohara
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10–13 Shinonome 1-chome, Koto-ku. Tokyo 135., Japan
S. Tanaka
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10–13 Shinonome 1-chome, Koto-ku. Tokyo 135., Japan
Get access

Abstract

High-resolution transmission electron microscopy (HREM) has been used to study the microstructures of Y-Ba-Cu-0 superconducting thin films in which the YBa2Cu4O8 phase was the main phase. From cross-sectional observations, the c-normal 123 phase predominated in the film near the substrate surface, while the c-normal 124 phase occupied the region near the film surface. Another remarkable microstructure was that a-normal 123 variants overcame the c-normal 123 region, but the c-normal 124 phase surpassed the a-normal 123 phase in the upper part of the film.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Karpinski, J., Kaldis, E., Jilek, E., Rusiecki, S. and Bucher, B., Nature 33A, 660 (1988).Google Scholar
2. Miyatake, T., Gotoh, S., Koshizuka, N. and Tanaka, S., Nature 341, 41 (1989).Google Scholar
3. Hayashi, H., Yamada, Y., Sugawara, K., Shiohara, Y. and Tanaka, S., Jpn. Appl. Phys. 30, L352 (1991).Google Scholar
4. Hayashi, H., Yamada, Y., Sugimoto, T., Shiohara, Y. and Tanaka, S., J. Jpn. Appl. Phys. 30, L725 (1991).Google Scholar
5. Hayashi, H., Yamada, Y., Baar, D. J., Sugimoto, T., Sugawara, K., Shiohara, Y. and Tanaka, S., J. Cryst. Growth 115, 782 (1991).Google Scholar
6. Hsieh, Y. F., Siegal, M. P., Hull, R. and Phillips, J. M., Appl. Phys. Lett. 57, 2268 (1990).Google Scholar
7. Dimos, D., Chaudhari, P., Mannhart, J. and LeGoues, F. K., Phs. Rev. Lett. 61, 219 (1988).Google Scholar