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Spin Coating Planarization Of Integrated Circuit Topography On A Rotating Disk

Published online by Cambridge University Press:  15 February 2011

Roger K. Yonkoski  and
David S. Soane
Roger K. Yonkoski
Affiliation:
Department of Chemical Engineering, University of California Berkeley, Berkeley CA 94720.
David S. Soane
Affiliation:
Department of Chemical Engineering, University of California Berkeley, Berkeley CA 94720.
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Abstract

Polyimide is commonly used in the microelectronic industry for interconnection applications because of its ability to planarize features typically found on an IC chip. A mathematical model is developed to describe fluid flow on a rotating disk based on the principles of mass and momentum conservation. Constitutive relationships necessary for this model are proposed. Experimental data for polyimide precursor solutions are presented which enable the determination of parameters for the constitutive equations. This model is used to describe the film profiles over flat surfaces and near micron-sized features. Attention is focused on the coupling between mass transport and fluid flow as well as the effects of surface tension on film profiles over topographical features.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 227: Symposium J – Materials Science of High Temperature Polymers for Microelectronics , 1991 , 259
Copyright
Copyright © Materials Research Society 1991

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