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Analyses of Ballistic Electron Transport in Nanocrystalline Porous Silicon

Published online by Cambridge University Press:  17 March 2011

Akira Kojima
Affiliation:
Tokyo Univ. of A&T, Dept of Electrical and Electronic Eng., Koganei, Tokyo 184-8588, Japan
Xia Sheng
Affiliation:
Tokyo Univ. of A&T, Dept of Electrical and Electronic Eng., Koganei, Tokyo 184-8588, Japan
Nobuyoshi Koshida
Affiliation:
Tokyo Univ. of A&T, Dept of Electrical and Electronic Eng., Koganei, Tokyo 184-8588, Japan
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Abstract

The characteristics of ballistic electron transport in porous silicon (PS) are investigated in terms of the electron emission from PS diodes and the energy distribution of emitted electrons. The energy distributions show a behavior of ballistic electron emission that is quite different with the Maxwellian distribution. This is clearly observed at low temperatures below 150 K where the electrical conduction in PS is dominated by the tunneling mode. At 100 K, the peak position of distribution curve becomes more close to the energy corresponding to the energy gain expected from ballistic transport without any scattering losses. The simulated energy distribution suggests that the electrons having higher energies in a non-equilibrium state travel ballistically in PS via field-induced tunneling process. These results support that electrons can travel ballistically in nanocrystalline layer under a high electric field. The observed ballistic transport indicates the further technological potential of silicon nanocrystallites.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

1. Canham, L. T., Appl. Phys. Lett. 57, 1046 (1990).Google Scholar
2. Koshida, N. and Koyama, H., Appl. Phys. Lett. 60, 347 (1992).Google Scholar
3. Takahashi, M., Toriumi, Y., Matsumoto, T., Masumoto, Y. and Koshida, N., Appl. Phys. Lett. 76, 1990 (2000).Google Scholar
4. Ueno, K. and Koshida, N., Appl. Phys. Lett. 74, 93 (1999).Google Scholar
5. Sheng, X. and Koshida, N., Mat. Res. Soc. Symp. Proc. 509, 193 (1998).Google Scholar
6. Shinoda, H., Nakajima, T., Ueno, K. and Koshida, N., Nature 400, 853 (1999).Google Scholar
7. Koshida, N., Sheng, X., and Komoda, T., Appl. Surf. Sci. 146, 371 (1999).Google Scholar
8. Kojima, A. and Koshida, N., Jpn. J. Appl. Phys. (2001) (to be published).Google Scholar
9. Gelloz, B. and Koshida, N., J. Appl. Phys. 88, 4319 (2000).Google Scholar
10. Shockley, W., The Bell System Technical Journal 29, 990 (1951).Google Scholar