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Application of Cathodic Arc Deposited Amorphous Hard Carbon Films to the Head/Disk Tribology

Published online by Cambridge University Press:  10 February 2011

Simone Anders ,
C. Singh Bhatia ,
Walton Fong ,
Roger Yu Lo  and
David B. Bogy
Simone Anders
Affiliation:
Lawrence Berkeley National Laboratory, I Cyclotron Road, Berkeley, CA 94720, SAnders@lbl.gov
C. Singh Bhatia
Affiliation:
SSD/IBM, 5600 Cottle Road, San Jose, CA 95193
Walton Fong
Affiliation:
Computer Mechanics Laboratory, Department of Mechanical Engineering, University of California at Berkeley, Berkeley, CA 94720
Roger Yu Lo
Affiliation:
Computer Mechanics Laboratory, Department of Mechanical Engineering, University of California at Berkeley, Berkeley, CA 94720
David B. Bogy
Affiliation:
Computer Mechanics Laboratory, Department of Mechanical Engineering, University of California at Berkeley, Berkeley, CA 94720
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Abstract

Amorphous hard carbon films deposited by filtered cathodic arc deposition exhibit very high hardness and elastic modulus, high mass density, low coefficient of friction, and the films are very smooth. All these properties are beneficial to applications of these films for the head/disk interface tribology. The properties of cathodic arc deposited amorphous carbon films are summarized, and they are compared to sputter deposited, hydrogenated (CHx), and nitrogenated (CNx) carbon films which are the present choice for hard disk and slider coatings. New developments in cathodic arc coaters are discussed which are of interest to the disk drive industry. Experiments on the nanotribology, mass density and hardness, corrosion behavior, and tribochemical behavior of cathodic arc films are reported. A number of applications of cathodic arc deposited films to hard disk and slider coatings are described. It is shown that their tribological performance is considerably better compared to CHx and CNx films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 517: Symposium F – Wide Bandgap Semiconductors for High Power, High Frequency , January 1998 , 371
Copyright
Copyright © Materials Research Society 1998

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