Hostname: page-component-848d4c4894-5nwft Total loading time: 0 Render date: 2024-05-25T14:20:56.414Z Has data issue: false hasContentIssue false

Atomic Force Microscope Study on Native Aluminum Nitride Substrates

Published online by Cambridge University Press:  01 February 2011

Sandra Schujman
Affiliation:
schujman@crystal-is.com, Crystal IS, Inc., 70 Cohoes Ave., Green Island, NY, 12183, United States, 518-271-7375, 518-271-7394
Wayne Liu
Affiliation:
liu@crystal-is.com
Nicholas Meyer
Affiliation:
meyer@crystal-is.com
Joseph A. Smart
Affiliation:
smart@crystal-is.com
Leo J. Scholwalter
Affiliation:
leo@crystal-is.com
Get access

Abstract

Native aluminum nitride (AlN) single crystal substrates are promising for use in epitaxial growth of III-nitride materials for fabrication of reliable deep UV light emitting and high power RF devices. Furthermore, the single crystals can be cut into different orientations, such as non-polar or pre-determined and specific misorientations, which will open a door for growing device structures with specially desired properties.

We have found several novel patterns on different orientation AlN substrates using Atomic Force Microscope (AFM). Aluminum nitride substrates with chemical-mechanical-polishing (CMP) finished surfaces, for a number of different misorientations with respect to the main hexagonal axis, that is, c-, a- and b-axis, show well differentiated structures. The AFM images reveal atomic level closed-loop rings. We believe these closed-loop rings are indicative of edge-dislocations. These structures are mostly seen on the near and on-axis aluminum polar surfaces. Atomic steps are not visible on the non-polar bare surfaces and for larger deviations from the polar axis (i.e., larger than 6 degrees from the c-axis). It is also noticed that even though atomic level steps are not always visible on the bare substrate for non-polar and large misorientations from the polar aluminum face, they can be observed after homoepitaxial and heteroepitaxial growth on these orientations. The research results indicate that both substrate orientation and surface treatment play an important role in forming different kinds of surface morphologies.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Rojo, J.C., Slack, G. A., Morgan, K., Raghothamachar, B., Dudley, M. and Schowalter, L. J.; J. Cryst. Growth 231, 317 (2001)CrossRefGoogle Scholar
2. Smart, J.A., Schremer, A.T., Weimann, N.G., Ambacher, O., Eastman, L.F., and Shealy, J.R., APL 75, 388 (1998).Google Scholar
3. Schowalter, L.J., Slack, G.A., Whitlock, J.B., Morgan, K., Schujman, S.B., Raghothamachar, B., Dudley, M. and Evans, K. R., phys. stat. sol., 0, 1997 (2003)Google Scholar
4. Smart, J.A., Chumbes, E.M., Srivatsa, L.N., Lo, Y.H. and Shealy, J.R., Spring '98, Mat. Res. Soc. Symp. Proc. Vol. 512, 59 (1998).CrossRefGoogle Scholar