Hostname: page-component-848d4c4894-p2v8j Total loading time: 0 Render date: 2024-04-30T21:07:50.889Z Has data issue: false hasContentIssue false
  • English
  • Français

Atomic Force Microscopy Study of Surface Evolution During Electrocrystallization of Zinc-Dion Alloys

Published online by Cambridge University Press:  10 February 2011

F. Czerwinski ,
K. Kondo  and
J. A. Szpunar
F. Czerwinski
Affiliation:
Department of Metallurgical Engineering, McGill University, Montreal, Canada, H3A 2A7
K. Kondo
Affiliation:
Department of Materials Science and Engineering, Hokkaido University, Sapporo, 060, Japan
J. A. Szpunar
Affiliation:
Department of Metallurgical Engineering, McGill University, Montreal, Canada, H3A 2A7
Get access

Abstract

Zn-Fe alloys, composed of η (h.c.p.) phase, were electrolytically deposited on cold rolled steel substrates from sulfate electrolytes. Deposits, which initially exhibited a morphology of approximately 20 nm thick platelets inclined 10–20 deg to the substrate surface, subsequently evolved either into triangular pyramids or hexagonal columnar crystals depending on the deposition conditions. A combination of X-ray texture measurements and AFM topographical analysis was used to characterize the growth surface of Zn-Fe alloys. For the morphology of hexagonal columnar crystals, the (00·1) basal planes were aligned perpendicular to the growth direction. For the morphology of the triangular pyramids, the (10·0) and (00·1) planes of η phase were tilted to the growth direction and surrounded the growth surface. For both morphologies the micro- and nanosize steps of growth were identified.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 451: Symposium P – Electrochemical Synthesis and Modification , 1996 , 445
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Binning, G., Quate, C.F., and Gerber, Ch., Phys. Rev. Lett., 56, 930 (1986).Google Scholar
2. Kondo, K., Yokoyama, M., and Shinohara, K., J. Electroch. Soc., 142, 2256 (1995).Google Scholar
3. Kondo, K., Murakami, T. and Shinohara, K., J. Electroch. Soc. Lett., 143, L75 (1996).Google Scholar
4. Park, H., Czerwinski, F., and Szpunar, J.A., in Electrochemically Deposited Thin Films II, editor Paunovic, M. (The Electrochemical Society, Pennington, NJ), 146 (1994).Google Scholar
5. Park, H., Czerwinski, F., and Szpunar, J.A., Materials Science Forum, 204–206, 703 (1996).Google Scholar
6. Bennett, J.M. and Mattsson, L., Surface Roughness and Scattering. Optical Society of America, Washington D.C. (1989).Google Scholar
7. Niederman, P. and Fisher, O., J. Microscopy, 152, 93 (1988).Google Scholar