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The atomic scale removal mechanism during chemomechanical polishing of Silicon: An atomic force microscopy study

Published online by Cambridge University Press:  01 February 2011

Futoshi Katsuki  and
Junji Watanabe
Futoshi Katsuki
Affiliation:
Corporate Research and Development Laboratories, Sumitomo Metal Industries Limited, 1–8 Fuso-cho, Amagasaki 660–0891, Japan
Junji Watanabe
Affiliation:
Department of Mechanical Engineering and Materials Science, Kumamoto University, 2–39–1 Kurokami, Kumamoto 860–8555, Japan
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Abstract

The pressure dependence of the microwear of an oxidized Si surface under aqueous electrolyte solutions has been investigated using an atomic force microscope with a single crystal Si tip. The removal ratio of Si tip to SiO2 surface is found to be highly sensitive to the contact pressure. We present a microscopic removal mechanism which is determined by an interplay of the diffusion of H2O in Si and SiO2.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 841: Symposium R – Fundamentals of Nanoindentation and Nanotribology III , 2004 , R9.13
Copyright
Copyright © Materials Research Society 2005

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References

REFERENCES

1. Mendel, E., Solid State Technol. 10, 27 (1967).Google Scholar
2. Patrick, W.J., Guthrie, W.L., Standley, C.L. and Schiable, P.M., J. Electrochem. Soc. 138, 1778 (1991).Google Scholar
3. Fusstetter, H., Schnegg, A., Graf, D., Kirschner, H., Brohl, M. and Wagner, P., Mater. Res. Soc. Symp. Proc. 386, 97 (1995).Google Scholar
4. Pietsch, G.J., Higashi, G.S. and Chabal, Y.J., Appl. Phys. Lett. 64, 3115 (1994).Google Scholar
5. Karaki, T., Miyake, S. and Watanabe, J., Bull. Japan Soc. of Prec. Eng. 12, 207 (1978).Google Scholar
6. kaneko, R., Miyamoto, T. and Hamada, E., “Microwear”, Handbook of Micro/Nano Tribology, ed. Bhushan, B. (CRC Press, 1995) pp.183–221.Google Scholar
7. Manne, S., Butt, H.H., Gould, S.A.C. and Hansma, P.K., Appl. Phys. Lett. 56, 1758 (1990).Google Scholar
8. Katsuki, F., Kamei, K., Saguchi, A., Takahashi, W. and Watanabe., J., J. Electrochem. Soc. 147, 2328 (2000).Google Scholar
9. Katsuki, F., Saguchi, A., Takahashi, W. and Watanabe, J., Jpn. J. Appl. Phys. 41, 4919 (2002).Google Scholar
10. Cook, L. M., J. Non-Cryst. Solids 120, 152 (1990).Google Scholar
11. Graf, D., Grundner, M. and Schulz, R., J. Vac. Sci. & Technol. A7, 807(1989).Google Scholar
12. Nogami, M. and Tomozawa, M., J. Am. Ceram. Soc. 67, 151 (1984).Google Scholar
13. Trogolo, J.A. and Rajan, K.: J. Mater. Sci. 29, 4454 (1994).Google Scholar