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Combined Spectroscopic Ellipsometry and Ion Beam Surface Analysis for In-Situ Real-Time Characterization of Complex Oxide Film Growth

Published online by Cambridge University Press:  10 February 2011

A.H. Mueller ,
Y. Gao ,
E.A. Irene ,
O. Auciello ,
A.R. Krauss  and
J.A. Schultz
A.H. Mueller
Affiliation:
Department of Chemistry, University of North Carolina at Chapel Hill
Y. Gao
Affiliation:
Department of Chemistry, University of North Carolina at Chapel Hill
E.A. Irene
Affiliation:
Department of Chemistry, University of North Carolina at Chapel Hill
O. Auciello
Affiliation:
Material Science Division, Argonne National Laboratory, Argonne, IL
A.R. Krauss
Affiliation:
Material Science and Chemistry Division, Argonne National Laboratory, Argonne, IL
J.A. Schultz
Affiliation:
lonwerks, Houston, Texas
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Abstract

In-situ real time characterization of chemically and structurally complex thin films is becoming important as complex materials are finding more applications in electronic devices. To this end, a unique thin film growth and deposition system was constructed combining a multi-target sputter deposition system with spectroscopic ellipsometry and time-of-flight ion scattering and recoil spectroscopy. This system is demonstrated with studies on YBa2Cu3O7−δand BaSrTiO3 films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 569: Symposium U – In Situ Process Diagnostics and Modelling , 1999 , 15
Copyright
Copyright © Materials Research Society 1999

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References

REFERENCES

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