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The Determination of the Oxygen Stoichiometry in High TC Superconducting Thin Films Using Nuclear Scattering of 3 Mev Protons

Published online by Cambridge University Press:  28 February 2011

H.-S. Jin
Affiliation:
Deparrment of Physics, Brooklyn College of The City University of New York, Brooklyn, New York, 11210
H. Homma
Affiliation:
Deparrment of Physics, Brooklyn College of The City University of New York, Brooklyn, New York, 11210
D. Yan
Affiliation:
Deparrment of Physics, Brooklyn College of The City University of New York, Brooklyn, New York, 11210
A.J. Drehman
Affiliation:
Solid State Sciences Directorate, Rome Air Development Center, Hanscom AFB, MA 01731
G.-C. Wang
Affiliation:
Department of Physics, Rensselaer Polytechnic Institute, Troy, New York, 12181
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Abstract

The nuclear scattering of 3 MeV protons on oxygen is applied to determine the oxygen stoichiometry in high Tc superconducting (HTS) thin films. Their oxide substrates are used as reference standards. This is a nondestructive, absolute method, which is as simple as the traditional Rutherford Backscattering Spectrometry (RBS). However, the relative sensitivity to oxygen has been enhanced. To obtain the stoichiometry, one only needs the data on atomic stopping powers and the chemical composition of the substates.When the measurements on the thin film and on the substate are carried out simultaneously, the inaccuracy in charge integration can be avoided and the accuracy of the oxygen stoichiometry can be further improved.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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