Hostname: page-component-848d4c4894-ndmmz Total loading time: 0 Render date: 2024-05-15T02:40:51.419Z Has data issue: false hasContentIssue false

Effect of Copper Film Thickness on Stress and Strain in Grains of Different Orientation

Published online by Cambridge University Press:  21 February 2011

R. P. Vinci
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305-2205
E. M. Zielinski
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305-2205
J. C. Bravman
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305-2205
Get access

Abstract

Models describing the effect of grain orientation on dislocation glide in a thin film are reviewed; it is predicted that differences in stress-temperature behavior should exist between grains of different orientation in a polycrystalline copper film. Direct x-ray evaluation of strains in {111} and {100| grains within primarily {111} textured copper films shows that these stresses are film thickness or grain size dependent. The {111} oriented grains behave as expected, with room temperature flow stress increasing linearly with 1/film thickness. The flow stress of grains of {100} orientation, however, is approximately constant with film thickness and is not well represented by the models. It is proposed that simplifying assumptions about orientation dependent yield may only be appropriate for the majority grain orientation population in a textured film.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Vinci, R.P., Ph.D. dissertation, Stanford University (1994).Google Scholar
[2] Zielinski, E.M., Vinci, R.P., Bravman, J.C., J. Appl. Phys. 76 4516 (1994).Google Scholar
[3] Tracy, D.P., Knorr, D.B., J. of Elec. Mater. 22 611 (1993).Google Scholar
[4] Thompson, C.V., Scripta Met. et Mater. 28 167 (1993).Google Scholar
[5] Sanchez, J.E. and Arzt, E., Scripta Met. et Mater. 27 285 (1992).Google Scholar
[6] Vinci, R.P. and Bravman, J.C., Mat. Res. Soc. Symp. Proc. 308 337 (1993).Google Scholar
[7] Nix, W.D., Met. Trans. A 20A 2217 (1989).Google Scholar
[8] Griffin, A.J., Brotzen, F.R., Dunn, C., Scripta Met. 20 1271 (1986).Google Scholar
[9] Courtney, T.H., Mechanical Behavior of Materials., (McGraw-Hill, New York 1990).Google Scholar
[10] Venkatraman, R. and Bravman, J.C., J. Mater. Res. 7 2040 (1992).Google Scholar
[11] Thompson, C.V., J. Mater. Res. 8 237 (1993).Google Scholar
[12] Besser, P.R., Sanchez, J.E., Brennan, S., Bravman, J.C., Takaoka, G., Yamada, I., Mat. Res. Soc. Symp. Proc. 343 659 (1994).Google Scholar
[13] Sanchez, J.E., Mat. Res. Soc. Symp. Proc. 343 641 (1994).Google Scholar
[14] Noyan, I.C. and Cohen, J.B., Residual Stress: Measurement by Diffraction and Interpretation., (Springer-Verlag, New York 1987).Google Scholar
[15] Flinn, P.A., Chiang, C., J. Appl. Phys. 67 2927 (1990).Google Scholar
[16] Vinci, R.P., Zielinski, E.M., Bravman, J.C., submitted to Thin Solid Films (1994).Google Scholar