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The Effects of Cross Hatch Angle (CHA) on Magnetic Properties and Read/Write Characteristics of CoCrPtTaB Thin Film Media

Published online by Cambridge University Press:  15 February 2011

Ga-Lane Chen ,
H. Do ,
T.-A. Yeh ,
J. M. Sivertsen  and
J. H. Judy
Ga-Lane Chen
Affiliation:
HMT Technology, 1055 Page Ave., Fremont, CA 94538
H. Do
Affiliation:
HMT Technology, 1055 Page Ave., Fremont, CA 94538
T.-A. Yeh
Affiliation:
Department of Materials Science, University of Minnesota, Minneapolis, MN 55455
J. M. Sivertsen
Affiliation:
Department of Materials Science, University of Minnesota, Minneapolis, MN 55455
J. H. Judy
Affiliation:
Department of Electrical Engineering, University of Minnesota, Minneapolis, MN55455
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Abstract

Cross-hatch type texturing has been widely used to replace circumferential texturing in the thin film media industry for optimizing tribology performance. However, higher “cross hatch angle” (CHA) may degrade magnetic performance. The relationship between texturing cross hatch angle (CHA) and magnetic properties and their effects on the read/write characteristics of sputtered thin film media are discussed in this paper. As the CHA increases, both the orientation ratio (OR) and the squareness ratio “S(c)/S(r)” decrease. The film with the highest OR is located at CHA=90, which has the lowest media noise. The medium has highest signal/noise ratio when CHA is equal to 90. PW50 can decrease as much as 4 nanoseconds as CHA increases to 730. By calculating a ratio of the intensity of Cr (110) + CoCrPtTaB (0002) to the intensity of Cr (200), we are able to correlate the intensity ratio to magnetic properties and read/write characteristics.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 343: Symposium H – Polycrystalline Thin Films - Structure, Texture, Properties and Applications , 1994 , 303
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

[1] Reith, T.M., Johnson, K.E., Wall, A C., and Wu, E.Y., JA-07, Digest of Intermag, 1992.Google Scholar
[2] Lee, J.K., Chao, A., Enguero, J., Smallen, M., Lee, H.J., and Dion, P., IEEE Transactions on Magnetics, Vol 28, NO.5, P. 2880, 1992.CrossRefGoogle Scholar
[3] Miller, M.S., Walber, J P., Erskine, H.F., Hagen, B.M., Hsu, Y., Sivertsen, J.M., Judy, J. H., and Speliotis, D.E., J. Appl. Phys, Vol. 70, P. 7518, 1991.CrossRefGoogle Scholar
[4] Takano, H., Lam, T.T., Zhu, J.-G., and Judy, J. H., IEEE Transactions on Magnetics, VOL. 29, NO.6, P. 3709, 1993.Google Scholar
[5] Deng, Y., Lambeth, D. N., and Laughlin, D.E., IEEE Mag., VOL. 29, NO.6, P. 3676, 1993.Google Scholar
[6] Doerner, M.F., Yogi, T.Y., Parker, D.S., and Nguyen, T., IEEE Transactions on Magnetics, VOL. 29, NO.6, P. 3667, 1993.Google Scholar
[7] Chen, T., and Yamashita, T., IEEE Transactions on Magnetics, VOL. 24, NO.6, P. 2700, 1988.Google Scholar
[8] Glijer, P., Sivertsen, J.M., and Judy, J.H., J. Appl. Phys., Vol. 73, P. 5563, 1993.CrossRefGoogle Scholar
[9] Paik, C.R., Suzuki, I., Tani, N., Ishikawa, M., Ota, Y., and Nakamura, K., IEEE Transactions on Magnetics, Vol. 28, NO. 5, P. 3084, Sep. 1992.Google Scholar
[10] Mirzamaani, M., Re, M., Lambert, S.E., Praino, A., Perterson, T.S., and Johnson, K.E., IEEE Transactions on Magnetics, Vol. 26, NO. 5, P. 2457, Sep. 1990.Google Scholar
[11] Arnoldussen, T.C., and Nunnelley, L.L., “Noise in Digital Magnetic Recording”, World Scientific Publishing Co., 1992 Google Scholar