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Extrinsic Contributions to Piezoresponse Force Microscopy

Published online by Cambridge University Press:  26 February 2011

Frank Peter ,
Bernd Reichenberg ,
Andreas Rüdiger ,
Rainer Waser  and
Krzysztof Szot
Frank Peter
Affiliation:
f.peter@fz-juelich.de, Research Centre Juelich, Leo-Brand-Str., Juelich, NRW, 52425, Germany
Bernd Reichenberg
Affiliation:
reichenberg@aixacct.com
Andreas Rüdiger
Affiliation:
a.ruediger@fz-juelich.de
Rainer Waser
Affiliation:
r.waser@fz-juelich.de
Krzysztof Szot
Affiliation:
k.szot@fz-juelich.de
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Abstract

Piezoresponse force microscopy (PFM) is the method of choice to investigate piezoactivity on a nanometer scale. A careful distinction between intrinsic and extrinsic effects are mandatory, especially when measuring ferroelectric nanostructures. We focus on two omnipresent extrinsic contributions with a substantial impact: firstly adsorbates on the surface of perovsike materials and secondly the dependence of the lateral piezoresponse on the topography. A thorough understanding of these extrinsic contributions is essential in order to avoid ambiguities in the analysis of PFM measurements.

Keywords

piezoresponseadsorptionscanning probe microscopy (SPM)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 902: Symposium T – Ferroelectric Thin Films XIII , 2005 , 0902-T07-02
Copyright
Copyright © Materials Research Society 2006

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References

1 Rüdiger, A., Schneller, T., Roelofs, A., Tiedke, S., Schmitz, T. and Waser, R., Appl. Phys. A. 80, 1247 (2005)Google Scholar
2 Gruverman, A., Kholkin, A., Kingon, A., and Tokumoto, H., Appl. Phys. Lett. 78, 2751 (2001)Google Scholar
3 Rodriguez, B., Gruverman, A., Kingon, A., Nemanich, R. J., and Cross, J., J. Appl. Phys 95, 1958 (2004)Google Scholar
4 Kalinin, S. and Gruverman, A., eds., Scanning Probe Microscopy: Electrical and Electromechanical Phenomena on the Nanoscale (Springer Verlag, 2005)Google Scholar
5 Brune, D., Helmborg, R., Whitlow, H., and Hunderi, O., Surface Characterization (Wiley-VCH, 1997)Google Scholar
6 Moulder, J. F., Stickle, W. F., Sobol, P., and Bomben, K., Handbook of X-ray Photoelectron Spectroscopy (Perkin-Elmer Corporation, 1992)Google Scholar
7 Peter, F., Szot, K., Waser, R., Reichenberg, B., Tiedke, S., and Szade, J., Appl. Phys. Lett. 85, 2896 (2004)Google Scholar
8 Otto, T., Grafström, S., and Eng, L. M., Ferroelectrics 303, 149 (2004)Google Scholar
9 Harnagea, C., Pignolet, A., Alexe, M., and Hesse, D., Integrated Ferroelectrics 44, 113 (2002)Google Scholar
10 Peter, F., Rüdiger, A., Dittmann, R., Waser, R., Szot, K., Reichenberg, B., and Prume, K., Appl. Phys. Lett. 87, 082901 (2005)Google Scholar