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Heteroepitaxial Growth of Zinc Oxide Single Crystal Thin Films on (111) Plane YSZ by Pulsed Laser Deposition

Published online by Cambridge University Press:  10 February 2011

Hiromichi Ohta
Affiliation:
HOYA corporation. R&D center. 3-3-1 Musashino, Akishima-shi, Tokyo 196-8510, JAPAN. Email hohta@rdc.hoya.co.jp
Hiroaki Tanji
Affiliation:
HOYA corporation. R&D center. 3-3-1 Musashino, Akishima-shi, Tokyo 196-8510, JAPAN.
Masahiro Orita
Affiliation:
HOYA corporation. R&D center. 3-3-1 Musashino, Akishima-shi, Tokyo 196-8510, JAPAN.
Hideo Hosono
Affiliation:
Tokyo Institute of Technology, Midori-ku. Yokohama-shi, Kanagawva 226-8503, JAPAN
Hiroshi Kawazoe
Affiliation:
Tokyo Institute of Technology, Midori-ku. Yokohama-shi, Kanagawva 226-8503, JAPAN
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Abstract

Heteroepitaxial ZnO films were grown on (111) surface of yttria stabilized zirconia (YSZ) and (0001) surface of sapphire by PLD method, using KrF eximer laser (248nm) in an ultra-high-vacuum chamber. ZnO grown on YSZ (111) at the substrate temperature of 800°C had an epitaxial relationship at the ZnO/YSZ interface of ZnO [1120]//YSZ [110]. Hexagonalshaped grains were observed whose surfaces were atomically flat. The grain size of ZnO increased and the Hall mobility rose toward 1400nm and 75cm2/Vs. respectively as film thickness increased from 10 nm to 800 nm.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

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References

REFERENCES

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