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High-Temperature Optical Properties of Thin-Film Vanadium Oxides – VO2 and V2O3

Published online by Cambridge University Press:  03 September 2012

Michael S. Thomas ,
Jeff F. DeNatale  and
Patrick J. Hood
Michael S. Thomas
Affiliation:
Materials Directorate, Wright Laboratory, WL/MLPJ, Wright-Patterson AFB, OH 45433-7702
Jeff F. DeNatale
Affiliation:
Rockwell Science Center, 1049 Camino Dos Rios, Thousand Oaks, CA 91360
Patrick J. Hood
Affiliation:
Materials Directorate, Wright Laboratory, WL/MLPJ, Wright-Patterson AFB, OH 45433-7702
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Abstract

Thin-film vanadium dioxide (VO2) and vanadium sesquioxide (V2O3) undergo shear phase transformations at 340K and 120K, respectively. The electrical and infrared optical properties of these materials are dramatically impacted by this phase transformation. Below the phase transition temperature, both VO2 and V2O3 are “poor” electrical insulators and have minimal absorption in the infrared spectral region. Above the phase transition temperature, both VO2 and V2O3 are poor conductors and are opaque in the infrared. The infrared thermochromic properties of these materials make them interesting candidates for several optical applications.

Utilization of either VO2 or V2O3 necessitates an accurate knowledge of the optical properties both above and below the phase transition temperature. This paper reports on some recent infrared ellipsometric measurements on the optical properties of these materials above the transition temperature. These measurements found that both are strongly dispersive through the 3–12 micron spectral region. In addition, the temperature dependence of the optical properties of VO2 above the transition temperature can be related to the film morphology and stoichiometry.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 479: Symposium S – Materials for Optical Limiting II , 1997 , 161
Copyright
Copyright © Materials Research Society 1997

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References

1 Adler, D., et al., Phys. Rev 155(3), 851 (1967).Google Scholar
2 McWhan, D.B., et al, J. dePhysique 31, C–1079 (1971).Google Scholar
3 Kachi, S., et.al., J. Phys. Soc. Japan 18, 1839 (1963).Google Scholar
4 Kucharczyk, D. and Niklewski, T., J. Appl. Cryst. 12, 370 (1979).Google Scholar
5 Paul, W., Mat. Res. Bull. 5, 691 (1970).Google Scholar
6 GTRI, “Investigation of Optical Techniques to Modify the MMW and MW Properties of Materials”, Project E-904-012 Final Report, 1990.Google Scholar
7 Case, F.C., Appl. Optics 30(28),4119 (1991)Google Scholar
8 Partlow, D.P., Gurkovich, S.R., Radford, K.C., and Denes, L.J., J. Appl. Phys. 70(1), 443 (1991).Google Scholar
9 Lu, S., et al., J. Mater. Sci. 28, 2169 (1993).Google Scholar
10 Zhuze, V.P., et al., Soy. Phys. Solid State, 13,260 (1971).Google Scholar
11 Fan, J.C., Tech. Rpt. No. ARPA-43 and HP 28, Office of Naval Research, May 1972.Google Scholar
12 DeNatale, J.F., et al., J. Appl. Phys. 66(12), 5844 (1989).Google Scholar
13 .Azzam, M.A. and Bashara, N.M., Ellipsometry and Polarized Light, North Holland Publishing Company, 1977.Google Scholar