Hostname: page-component-76fb5796d-vfjqv Total loading time: 0 Render date: 2024-04-29T21:34:52.223Z Has data issue: false hasContentIssue false

Hydrogen Passivation Studies in Dislocated CZ and FZ Silicon

Published online by Cambridge University Press:  25 February 2011

C. Dubé
Affiliation:
Mobil Solar Energy Corporation, 4 Suburban Park Drive, Billerica, Mass 01821
J. P. Kalejs
Affiliation:
Mobil Solar Energy Corporation, 4 Suburban Park Drive, Billerica, Mass 01821
S. Rajendran
Affiliation:
Mobil Solar Energy Corporation, 4 Suburban Park Drive, Billerica, Mass 01821
Get access

Abstract

Hydrogen passivation using a Kaufmann ion source at 400°C has been carried out on FZ and CZ silicon dislocated by four-point bending at high temperatures. The results differ from those reported for dislocations passivated in silicon sheet grown by the EFG technique. A model for hydrogen diffusion and trapping is presented to argue that the differences observed are not produced by hydrogen transport effects in the bulk.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Dubé, C. Hanoka, J.I. and Sandstrom, D.B.. Appl. Phys. Lett. 44, 425(1984); C. Dube and J.I. Hanoka, ibid., 45, 1135(1984).Google Scholar
2 Pearton, S.J., Corbett, J.W. and Shi, T.S., Appl. Phys. A 43, 153(1987).Google Scholar
3 Kalejs, J.P. and Rajendran, S., to be published in Applied Physics Letters, Dec. 1989.Google Scholar
4 Annual Book of ASTM Standards (McGraw Hill, Philadelphia, 1978).Google Scholar
5 Van Wieringen, A. and Warmoltz, N., Physica 22, 849(1956).Google Scholar