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In Situ Observation of Oxidization Process at the Most Upper Surfaces by x-ray Surface Propagation Waves

Published online by Cambridge University Press:  10 February 2011

Toshihisa Horiuchi ,
Kenji Ishida  and
Kazumi Matsushige
Toshihisa Horiuchi
Affiliation:
Department of Electronic Science and Engineering, Graduate School of Engineering, Kyoto University, Yoshida-honmashi, Sakyo-ku, Kyoto 606-8501, Japan
Kenji Ishida
Affiliation:
Department of Electronic Science and Engineering, Graduate School of Engineering, Kyoto University, Yoshida-honmashi, Sakyo-ku, Kyoto 606-8501, Japan
Kazumi Matsushige
Affiliation:
Department of Electronic Science and Engineering, Graduate School of Engineering, Kyoto University, Yoshida-honmashi, Sakyo-ku, Kyoto 606-8501, Japan
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Abstract

The characteristics and applicable studies of the x rays scattered and propagating near the most upper surface of the substrate under the total reflection condition are described. Since the peak energy of the x rays gives direct information on the electron density of the surface materials, some experiments have been first conducted to confirm this. Then, an in-situ observation of oxidization processes for evaporated Cu films has been also conducted under a UV irradiation and an acid vapor exposure, revealing that there exist several oxidizing stages in time variations, namely a slight increase in the electron density at the initial stage, subsequently an abrupt decrease, and then steady value suggesting the sealing-off mechanism in the oxidization phenomena.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 591 , 1999 , 15
Copyright
Copyright © Materials Research Society 2000

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References

REFERENCES

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