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Interface Stress and an Apparent Negative Poisson's Ratio in Ag/Ni Multilayers

Published online by Cambridge University Press:  10 February 2011

K. O. Schweitz ,
H. Geisler ,
J. Chevallier ,
J. Bøttiger  and
R. Feidenhans'l
K. O. Schweitz
Affiliation:
Institute of Physics and Astronomy, Aarhus University, DK-8000 Aarhus C, Denmark, kos@dfi.aau.dk
H. Geisler
Affiliation:
Institute of Physics and Astronomy, Aarhus University, DK-8000 Aarhus C, Denmark, kos@dfi.aau.dk
J. Chevallier
Affiliation:
Institute of Physics and Astronomy, Aarhus University, DK-8000 Aarhus C, Denmark, kos@dfi.aau.dk
J. Bøttiger
Affiliation:
Institute of Physics and Astronomy, Aarhus University, DK-8000 Aarhus C, Denmark, kos@dfi.aau.dk
R. Feidenhans'l
Affiliation:
Condensed Matter Physics and Chemistry Department, Risø National Laboratory, DK-4000 Roskilde, Denmark
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Abstract

By use of dc-magnetron sputtering, (111) textured Ag/Ni multilayered thin films were deposited with nominal bilayer repeat lengths ranging from 2 nm to 250 nm. Bulk and interface stresses were obtained from X-ray diffraction and measurements of substrate curvatures. Both in-plane and out-of-plane expansions were observed in the Ni layers, and a compressive interface stress of −2.24±0.21 J/m2 was found. This is in agreement with a previously published result of the interface stress in Ag/Ni thin films which had, as opposed to the present multilayers, a high level of total stress.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 505 , 1997 , 559
Copyright
Copyright © Materials Research Society 1998

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Footnotes

1

present address: Institut für Werkstoffwissenschaft, Technische Universität Dresden, D-01062 Dresden, Germany

References

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