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Ion Mixing in Film-Substrate Systems Under Polyenergetic Ar+Ion Beam Irradiation

Published online by Cambridge University Press:  21 February 2011

B.A. Kalin
Affiliation:
Moscow State Engineering Physics Institute (Technical University): Kashirskoe sh. 31115409, Moscow, Russia
N.V. Volkov
Affiliation:
Moscow State Engineering Physics Institute (Technical University): Kashirskoe sh. 31115409, Moscow, Russia
B.P. Gladkov
Affiliation:
Moscow State Engineering Physics Institute (Technical University): Kashirskoe sh. 31115409, Moscow, Russia
S.E. Sabo
Affiliation:
Moscow State Engineering Physics Institute (Technical University): Kashirskoe sh. 31115409, Moscow, Russia
I.H. Atalikova
Affiliation:
Moscow State Engineering Physics Institute (Technical University): Kashirskoe sh. 31115409, Moscow, Russia
A.A. Altuhov
Affiliation:
Moscow State Engineering Physics Institute (Technical University): Kashirskoe sh. 31115409, Moscow, Russia
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Abstract

The results of alloying Al, Fe, and Mo surfaces by Be, Al, Ni, Sn under polyenergetic Ar+ ion beam irradiation with a mean energy of 10 keV have been presented. It has been shown that along with film and substrate materials sputtering there takes place the penetration of film atoms into substrate materials at a depth which is significantly greater (by a factor of 3… 10) than the projective range of ions in the given materials. The analysis of possible alloying depths with regard to different models (pure radiation range for monoenergetic ion beams; when the decrease of concentration is approximated by the exponential dependence; when the internal forcing out stresses are taken into account) for equal irradiation dose shows that the model, in which the migration of implanted atoms in the fields of forcing out stresses are considered, gives most close agreement between the calculated data and experimental ones.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

1 Kalin, B.A., GIadkov, V.P., Volkov, N.V., Sabo, S.E., Atom Penetration A Thin Film Into Substrates During Sputtering By Polyenergetic Ar+ Ion Beam With Mean Energy Of 9.4 keV.- XY Materials Research Society, Boston, USA, 1994-P.214.Google Scholar
2 Kalin, B.A., Volkov, N.V., Sabo, S.E. at. al., Raspylenie tonkih plenok napoverhnosty materialov pri obluchenii polyenergeticheskim puchkom ionov Ar+ so sredney energiey 9.4 keV, Poverhnost', 1995. No11, pp.127132.Google Scholar
3 Volkov, N.V., Kalin, B.A.. “Materialovedcheskie voprosi atomnoi techniki” (“Material science problems of nuclear engineering”), edited by Kalin, B.A., Energoatomizdat, Moscow, 1991, pp 6467.Google Scholar
4 Shiputov, A.T., Obratnoe rasseyanie bystryh ionov -Rostov, Rostovskiy universitet, 1988-p. 154.Google Scholar
5 Feldman, L., Mayer, D., Osnovy analiza poverhnosty tonkih plenok .- M.: Mir, 1989-P.342.Google Scholar
6 Brice, D.K., J. Rad. Eff., 11, 227 (1971).Google Scholar
7 Burenkov, A.F., Komarov, F.F., Temkin, M.M. and Schlotzhauer, G. Rad. Eff. Lett., 86(5), 161 (1984).Google Scholar
8 Martynenko, Yu. V., “Puchki zaryajennich chastits i tverdoe telo” (“Charged particle beams and a solid body”) 7, edited by B.B. Kadamtsev, (VINITI, 1993) pp. 82112.Google Scholar