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Microstructure of Gold Films Grown by Ion Induced Deposition

Published online by Cambridge University Press:  26 February 2011

J.S. Ro ,
A.D. Dubner ,
C.V. Thompson  and
J. Melngailis
J.S. Ro
Affiliation:
Materials Science & Engineering, M.I.T., 77 Massachusetts Avenue, Cambridge, MA 02139
A.D. Dubner
Affiliation:
Materials Science & Engineering, M.I.T., 77 Massachusetts Avenue, Cambridge, MA 02139
C.V. Thompson
Affiliation:
Materials Science & Engineering, M.I.T., 77 Massachusetts Avenue, Cambridge, MA 02139
J. Melngailis
Affiliation:
Research Laboratory of Electronics, M.I.T., Cambridge, MA 02139
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Abstract

A beam of ions incident on a substrate can cause adsorbed gas molecules to break up, resulting in material deposition. We have previously demonstrated deposition of gold from a gas of dimethyl gold hexafluoro acetylacetonate (C7H7F6O2Au) using both focused and broad ion beams. Here we investigate growth at various substrate temperatures and examine micro-structure using transmission electron microscopy. Films grown at room temperature were discontinuous even up to the thickness of 250μπι while films grown at higher substrate temperatures were continuous even at lower thicknesses. Deposition carried out on substrates at 100°C and 160°C using 70 kev Ar+ ions resulted in resistivities approaching the bulk value and a deposition yield of 60 to 75 atoms/ion. The relationship between growth conditions, micro-structure and resistivity will be discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 101: Symposium B – Laser and Particle-Beam Chemical Processing for Microelectronics , 1987 , 255
Copyright
Copyright © Materials Research Society 1998

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References

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