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Modification of Fused Silica Materials for Excimer Laser Optics—measurement of laser induced defects and its reformation—

Published online by Cambridge University Press:  25 February 2011

Yasutaka Matsumoto ,
Yoshihiro Yoshikado  and
Masataka Murahara
Yasutaka Matsumoto
Affiliation:
Graduate student of Faculty of Eng. Tokai Univ., 1117 Kitakaname, Hiratsuka, Kanagawa, 259–12, JAPAN
Yoshihiro Yoshikado
Affiliation:
Student of Faculty of Eng. Tokai Univ., 1117 Kitakaname, Hiratsuka, Kanagawa, 259–12, JAPAN
Masataka Murahara
Affiliation:
Faculty of Eng. Tokai Univ., 1117 Kitakaname, Hiratsuka, Kanagawa, 259–12, JAPAN
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Abstract

Fused silica is widely used material in window and lens applications for excimer laser processing. The transmittance of the laser beam in fused silica is attenuated approximately 40% by high fluence ArF excimer laser irradiation. The attenuation of the transmittance corresponds to the growth of an absorption band at 215nm. This phenomenon is troublesome for laser lithography. To investigate this effect, we examined the laser induced luminescence and absorption under various conditions. The 215nm absorption band was diminished by annealing at 900 °C for 2 hours in He ambient. Ke could successfully obtain good optical material, whose transmittance remains constant with increasing ArF laser(193nm) shot exposure.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 279: Symposium A – Beam-Solid Interactions–Fundamentals and Applications , 1992 , 723
Copyright
Copyright © Materials Research Society 1993

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