Hostname: page-component-848d4c4894-pftt2 Total loading time: 0 Render date: 2024-04-30T15:13:44.655Z Has data issue: false hasContentIssue false
  • English
  • Français

Plasma Polymerization of Low Dielectric Constant Fluoro-Hydrocarbon Film

Published online by Cambridge University Press:  10 February 2011

Wei William Lee ,
George Tyndall ,
Raymond Zehringer  and
Mark Crowder
Wei William Lee
Affiliation:
now with TSMC, (2410) NO. 9, Creation Rd. 1, Science-Based Ind. Park, Hsin-Chu, Taiwan, wwlee@tsmc.com.tw
George Tyndall
Affiliation:
IBM Almaden Research Center, San Jose, CA 95120
Raymond Zehringer
Affiliation:
IBM Almaden Research Center, San Jose, CA 95120
Mark Crowder
Affiliation:
IBM Almaden Research Center, San Jose, CA 95120
Get access

Abstract

Low dielectric constant fluoro-hydrocarbon polymer films were deposited using an electron cyclotron resonance (ECR) plasma source with pentafluorostyrene as a precursor. The pentafluorostyrene is a cyclic liquid monomer with relative high vapor pressure. The chemical structure of the deposited films were characterized by X-ray photoelectron spectroscopy, infrared spectroscopy and Rutherford backscattering spectroscopy. The structure of deposited films studies gave an insight of the fluorohydrocarbon polymer formation regarding to deposition conditions. The dielectric constant of the film was found in the range of 2.2 to 2.4. The influence of deposition conditions on chemical, physical and electrical properties of the resulting films were evaluated.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 544: Symposium Y – Plasma Deposition and Treatment of Polymers , 1998 , 161
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Lee, W.W. and Ho, P., guest editors; MRS Bulletin theme issue "Low Dielectric Constant Materials", Vol.22, No.10, p19–p69, 1997.Google Scholar
2. Boenig, H. V., Fundamentals of Plasma Chemistry and Technology, (Technomic Publish. Co. Lancaster, PA, 1988).Google Scholar
3. Bicerano, J., Prediction of Polymer Properties, (Marcel Dekker, New York, 1993).Google Scholar
4. Asmussen, J., in Handbook of Plasma Processing and Technology, edited by Rossnagel, S.M., Cuomo, J.J. and Westwood, W.O., (Noyce, Park Ridge, N. J., 1989), p. 329.Google Scholar
5. Zehringer, R., Lee, W., Tyndall, G., Baum, T. and Crowder, M. (to be published).Google Scholar