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Properties Oftetrahedralamorphous Carbon Films Deposited By the Filtered Cathodicarc Method

Published online by Cambridge University Press:  11 February 2011

Naruhisa Nagata
Affiliation:
Fuji Electric Corporate Research and Development, Ltd., Device Technology Laboratory, Matsumoto, Nagano, JAPAN
Kazuhiro Kusakawa
Affiliation:
Fuji Electric Corporate Research and Development, Ltd., Device Technology Laboratory, Matsumoto, Nagano, JAPAN
Akiyasu Kumagai
Affiliation:
Fuji Electric Corporate Research and Development, Ltd., Device Technology Laboratory, Matsumoto, Nagano, JAPAN
Hideaki Matsuyama
Affiliation:
Fuji Electric Corporate Research and Development, Ltd., Material Science and Technology, Laboratory, Yokosuka, Kanagawa, JAPAN
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Abstract

First, we studied the relation between the sp3 bond ratio and the hardness of 100-nm-thick tetrahedral amorphous carbon (ta-C) films deposited by a Filtered Cathodic Arc (FCA) system at different substrate bias voltages. For comparison, sputtered amorphous carbon (a-C) films and Highly Oriented Pyrolytic Graphite (HOPG) were also analyzed. According to the results, ta-C film deposited at a -70 volt substrate bias voltage had high hardness and high sp3 bond ratio of up to 88 GPa and 85%, respectively, whereas those of sputtered a-C were 29 GPa and 28%. Furthermore, we found that the hardness of carbon films, including sputtered a-C and HOPG, increased with increasing sp3 bond ratio. Based on this relation, the chemical bond structures of carbon films are considered to be closely related to their mechanical properties. Secondly, we investigated the relation between sp3 bond ratio and ta-C film thickness, over the range from 1 to 10 nm. The measurements showed that a 2-nm-thick initial layer grown on the surface of CoCrPt magnetic film had low sp3 bond ratios. It is suggested that this reduction in sp3 bond ratio in the initially grown layer seriously degrades the film's performance as a hard disk media overcoat. Further efforts to improve ta-C film processing will be required to improve its mechanical properties.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

REFERENCES

[1] Jacob, W. and Möller, W., Appl. Phys. Lett., 63 (13), 1771 (1993)Google Scholar
[2] Ferrari, A. C. and Robertson, J., Phys. Rev. B, 61, 14095 (2000)Google Scholar
[3] Anders, S., Anders, A., and Brown, I., J. Appl. Phys., 75 (10), 4895 (1994)Google Scholar
[4] Anders, A., Anders, S., and Brown, I., J. Appl. Phys., 75 (10), 4900 (1994)Google Scholar
[5] Zhitomirsky, V. N., Boxman, R. L., and Goldsmith, S., J. Vac. Sci. Technol. A, 13 (4), 2233 (1995)Google Scholar
[6] Shi, X., Tay, B. K., Flynn, D. I., Ye, Q., Sun, Z., Surf. Coat. Technol., 94/95, 195 (1997)Google Scholar
[7] Hyodo, H., Yamamoto, T., and Toyoguchi, T., IEEE Trans. Magn., 37 (4), 1789 (2001)Google Scholar
[8] Tsuji, H., Nakamura, S., Yoshihara, T., Gotoh, Y. and Ishikawa, J., J. Vac. Soc. Jpn., 42 (3), 221 (1999)Google Scholar
[9] Díaz, J., Paolicelli, G., Ferrer, S., and Comin, F., Phys. Rev. B, 54, 8064 (1996)Google Scholar
[10] Proctor, A. and Sherwood, P. M. A., Anal. Chem., 54, 13 (1982)Google Scholar
[11] Lifshitz, Y., Kasi, S. R., and Rabalais, J. W., Phys. Rev. Lett., 62, 1290 (1989)Google Scholar