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Reaction Of Amorphous And Crystalline Alloys With Silicon

Published online by Cambridge University Press:  26 February 2011

L. S. Hung ,
S. Q. Wang ,
J. W. Mayer  and
F. W. Saris
L. S. Hung
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
S. Q. Wang
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
J. W. Mayer
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
F. W. Saris
Affiliation:
FOM Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The, Netherlands
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Abstract

The reaction of Ni- refractory metal alloys with silicon has been studied by backscattering spectrometry and transmission electron microscopy. The analysis of the as-deposited sample revealed solid solutions for Ni-Cr and amorphous phases for Ni-Ta and Ni-Ti. In situ annealing resulted in crystallization of Ni43 Ta57 at 750 °C, a value above the reaction temperature of the alloy with silicon. The amorphous alloy of Ni48Ti52 was transformed into the equilibrium compound of NiTi at 450 °C, much below the reaction temperature. Phase separation has been observed in the Ni-Cr and Ni-Ta systems with a Ni- silicide layer next to the Si substrate and a refractory disilicide layer on the other side. In contrast, Si reacts with the NiTi compound to form a uniform mixed layer with a composition of NiTiSi2. The different behavior is explained based on considerations of both thermodynamic and kinetic terms.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 54 , 1985 , 159
Copyright
Copyright © Materials Research Society 1986

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References

REFERENCES

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