Hostname: page-component-848d4c4894-4hhp2 Total loading time: 0 Render date: 2024-05-12T07:23:41.647Z Has data issue: false hasContentIssue false

Rf Hollow Cathode Plasma Jet Depopsition of BaxSR1-XTI03 Films

Published online by Cambridge University Press:  01 February 2011

N.J. Ianno
Affiliation:
Department of Electrical Engineering, 209N WSEC, University of Nebraska-Lincoln, NE 68588, USA
R.J. Soukup
Affiliation:
Department of Electrical Engineering, 209N WSEC, University of Nebraska-Lincoln, NE 68588, USA
Z. Hubička
Affiliation:
Institute of Physics ASCR, Na Slovance 2 182 21 Prague 8 Czech Republic
J. Olejnčcek
Affiliation:
Institute of Physics ASCR, Na Slovance 2 182 21 Prague 8 Czech Republic
H. Ŝíchová
Affiliation:
Institute of Physics ASCR, Na Slovance 2 182 21 Prague 8 Czech Republic
Get access

Abstract

An initial study of the RF hollow cathode plasma jet deposition of BaxSr1-xTiO3 has been performed. Deposition occurred from a single composite nozzle consisting of BaTiO3 and SrTiO3 at substrate temperatures on the 500-550 C range. It has been shown that film composition can be easily controlled by the nozzle composition as well as other deposition parameters. The as-deposited films exhibit clear BSTO peaks with grain size on the order of 30nm.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Scott, J.J., Ferroelectric 183, 51 (1996).Google Scholar
2 Scott, J.F., Integrated Ferroelectrics 20, 15 (1998).Google Scholar
3 Li, J., Duewaer, F., Gao, C., Chang, H., Xiang, X.D. and Lu Y, Y., Appl. Phys. Lett. 76, 769 (2000).Google Scholar
4 Park, B.H., Peterson, E.J., Jia, Q.X., Lee, J., Zeng, X., Si, W.I., and Xi, X.X., Appl. Phys. Lett. 78, 533 (2001).Google Scholar
5 Cardonna, M., Phys. Rev. A 140, 651 (1965).Google Scholar
6 , Pribil, Hubicka, Z., Soukup, R.J., and Ianno, N.J., J. Vac. Sci. Technol. A 19, 1571 (2001).Google Scholar
7 Hubicka, Z., Pribil, G., Soukup, R.J., Ianno, N.J., Surf. Coat. Technol. 160, 114 (2002).Google Scholar
8 Soukup, R.J., Ianno, N.J., Pribil G, G., and Hubicka, Z., Surf. Coat. Technol. 177-178, 676 (2004).Google Scholar
9 Bárdoŝ, L., Berg S, S., and Baránková, H., J. Vac. Sci. Technol. A 11, 1486 (1993).Google Scholar
10 Baránková, H., Bárdoŝ, L., and Berg, S., J., Electrochem. Soc. 142, 883 (1995).Google Scholar
11 Soukup, L. Perina, L. V., Jastrabik, L., Ŝícha, M., Pokorny, P., and Soukup, R.J., Surf. Coat. Technol. 78, 280 (1996).Google Scholar
12 Hubicka, Z., Cada, C. Jakubec, C. I., Bludska, J., Malkovs, Z., Trunmd, B., Pridal, J., and Jastrabik, L., Surf. Coat. Technol. 174-175, 632 (2003).Google Scholar
13 Hubicka, Z., Ŝícha, M., Pajasova, L., Soukup, L., Jastrabík, L., Chvostová, D., and Wagner, T., Surf. Coat. Tech. 142, (2001) 681.Google Scholar
14 Ianno, N.J., Soukup, R.J., Lauer, N., and Hubicka, Z., “RF Hollow Cathode Plasma Jet Deposition of BaXSr1-XTi03 films” presented at the XIII International Materials Research Congress 2004, August 2004 Cancun Mexico.Google Scholar