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Sequential Stretching Lithography

Published online by Cambridge University Press:  01 February 2011

Haojing Lin
Affiliation:
linhaojing1983@hotmail.com, University of Nebraska, Department of Engineering Mechanics and Nebraska Center for Materials and Nanoscience, Lincoln, NE, 68588, United States
Ocelio V Lima
Affiliation:
oceliovl@uol.com.br, University of Nebraska, Department of Engineering Mechanics and Nebraska Center for Materials and Nanoscience, Lincoln, NE, 68588, United States
Li Tan
Affiliation:
ltan4@unl.edu, University of Nebraska, Department of Engineering Mechanics and Nebraska Center for Materials and Nanoscience, Lincoln, NE, 68588, United States
Zheng Li
Affiliation:
jucylee2004@hotmail.com, University of Nebraska, Department of Engineering Mechanics and Nebraska Center for Materials and Nanoscience, Lincoln, NE, 68588, United States
Jiangyu Li
Affiliation:
jucylee2004@hotmail.com, University of Nebraska, Department of Engineering Mechanics and Nebraska Center for Materials and Nanoscience, Lincoln, NE, 68588, United States
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Abstract

We developed an embossing/imprinting based nanofabrication technique, dubbed Sequential Stretching Lithography (SSL). In this process, a master pattern is imprinted into an elastomer containing a film of uncured elastomer. The elastomer is cured and then elongated to increase feature density and reduce feature size. Replication of this substrate yields a new master that can be used in further reduction steps. One-dimensional grating features with a pitch size below 200 nm were fabricated from 750 nm-pitch grating lines. This process gives us a faithful pattern miniaturization in all aspects and, as a result, a much effective control on density and dimension regulation.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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References

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