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Silicon Thin Film Deposition on Nano-Structured ZnO Substrates

Published online by Cambridge University Press:  17 March 2011

R. Könenkamp ,
V. Chu ,
J. Conde  and
L. Dloczik
R. Könenkamp
Affiliation:
Hahn-Meitner Institut Berlin, Glienicker Str. 100, 14109 Berlin, Germany
V. Chu
Affiliation:
Instituto de Engenharia de Sistemas e Computadores, Rua Alves Redol 9, 1000-029 Lisbon
J. Conde
Affiliation:
Dept. of Materials Engineering, Instituto Superior Tecnico, Av. Rovisco Pais, 1049-001 Lisbon, Portugal
L. Dloczik
Affiliation:
Hahn-Meitner Institut Berlin, Glienicker Str. 100, 14109 Berlin, Germany
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Abstract

Amorphous and micro-crystalline Si films have been deposited by the hot-wire technique on deeply structured columnar ZnO films. It is found that nearly perfect conformal deposition occurs for amorphous films, similar to what was previously found for rf-plasma deposited films. Micro-crystalline films deposited by the hot wire technique are less conformal since deposition occurs preferentially on protruding features of the substrate, while films deposited by rf-plasma CVD exhibit high conformality.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 664: Symposium A – Amorphous and Heterogeneous Silicon-Based Films-2001 , 2001 , A24.5
Copyright
Copyright © Materials Research Society 2001

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References

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