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Solid State Structures, Decomposition Pathways, and Vapor Phase Byproducts of Y(acac)3 Type OMVPE Precursors for thin films of Yttrium -Containing Ceramic Materials

Published online by Cambridge University Press:  25 February 2011

William S. Ree Jr
Affiliation:
Department of Chemistry and Materials Research and Technology Center, Florida State University, Tallahassee, FL.
Henry A. Luten
Affiliation:
Department of Chemistry and Materials Research and Technology Center, Florida State University, Tallahassee, FL.
Michael W. Carris
Affiliation:
Department of Chemistry and Materials Research and Technology Center, Florida State University, Tallahassee, FL.
Eric J. Doskocil
Affiliation:
Department of Chemistry and Materials Research and Technology Center, Florida State University, Tallahassee, FL.
Virgil L. Goedken
Affiliation:
Department of Chemistry and Materials Research and Technology Center, Florida State University, Tallahassee, FL.
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Abstract

Several useful ceramic materials target compositions contain yttrium, Y2O3 and YBa2Cu3O7-δ being the two most widely employed. One known CVD precursor for yttrium-containing thin films is Y(tmhd)3 H2O (tmhd = 2,2,6,6-tetramethylheptane-3,5-dionato). We have determined the structure and examined the vapor phase decomposition of this species. A related compound, [Y(tmod)3]2(tmod = 2,2,7-trimethyloctane-3,5-dionato), has been prepared, structurally characterized, and studied as an organometallic vapor phase epitaxy (OMVPE) precursor for Y and Y2O3 films. Mechanisms of vapor phase decomposition are discussed in terms of solid film deposits and vapor phase by-products. The two precursors are compared to each other with respect to their stability windows, defined as being bound by source volatility on the low side and source stability on the high side.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

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