Hostname: page-component-848d4c4894-xfwgj Total loading time: 0 Render date: 2024-06-14T02:01:32.733Z Has data issue: false hasContentIssue false

Surface and Subsurface Morphology of Laser Bean Annealed Auge/Gaaa Ohmic Contacts

Published online by Cambridge University Press:  15 February 2011

O. Aina
Affiliation:
General Electric Co., Corporate Research and Development, Schenoctady, New York 12301
J. Norton
Affiliation:
General Electric Co., Corporate Research and Development, Schenoctady, New York 12301
W. Katz
Affiliation:
General Electric Co., Corporate Research and Development, Schenoctady, New York 12301
G. Smith
Affiliation:
General Electric Co., Corporate Research and Development, Schenoctady, New York 12301
K. Rose
Affiliation:
Rensselaer Polytechnic Institute, Troy, NY 12181
Get access

Abstract

A study of the pulsed laser annealing of AuGe films on GaAs using a Nd:YAG laser has revealed differences between the surface and subsurface morfhologies. At laser energy densities lower than 1.1 J/cm2 , the surface retained the smooth, “golden” appearance of deposited AuGe films, while evidence of damage was observed below the surface. At higher energy densities, surface damage was observed. SIMS profiles of Ga and As in the AuGe layer and a laser heating model have been used to explain the presence or absence of damage in terms of the outdiffusion of As and Ga through the laser created melt which leads to the presence or absence of Ga and As at the surface and below the surface.

Type
Research Article
Copyright
Copyright © Materials Research Society 1982

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Eckhardt, G. et al. , “Laser and Electron Beam Processing of Materials”, White, C.W., Peercy, P.S., Eds. p.467, New York, Academic Press, 1980.CrossRefGoogle Scholar
[2] Draby, A.H., Murakam, K., Yuba, Y., Gamo, K., Namba, S., Masuda, F.. Appl. Phys. Letts., 38, p.562 (1981).Google Scholar
[3] Miller, D.C., J. Electrochem Soc., 127, #2, p. 467 (1979).Google Scholar
[4] Yu, A.Y.C., Gopen, H.J., Waits, R.K., Air Force Technical Report.Google Scholar
[5] Aina, O., Chiang, S.W., Liu, Y.S., Bacon, F., Rose, K., J. Electrochem Soc., 128, p. 2183 (1981).Google Scholar
[6] Bhasti, P.L., Mukherjee, S.N., Mohan, S., Thin Solid Films 41, p.L3 (1977).Google Scholar
[7] Katz, W., Smith, G., Aina, O., Baliga, B.J., Rose, K., Applications of Surface Science, 9, 1981 (to be published).Google Scholar
[8] Von Allmen, M., Proceedings of the 1979 Symposium on Laser and Electron Beam Processing of Materials, p. 7 , Academic Press (1980).Google Scholar
[9] Parks, H.G., PhD. Thesis, Rensselaer Polytechnic Institute, (1980).Google Scholar
[10] Smithells, C.J., Metals Reference Book, Butterworth, London (1976).Google Scholar
[11] Maydan, D., Bell System Technical Journal, 15, p. 1761 (1971).CrossRefGoogle Scholar
[12] Otsubo, M., Kumabe, H., Miki, H., Solid State Electronics 20, p. 617 (1977).CrossRefGoogle Scholar
[13] Fair, B., J. Appl. Phys. 50, p. 6552 (1979).Google Scholar
[14] Diffusion and Defect Data, Vol 10, p.86, Transtech Publications (1975).Google Scholar
[15] Partington, J.R., An Advanced Treatise on Physical Chemistry, Vol 1, p.271, Longmans, London (1949).Google Scholar
[16] Aina, O., Katz, W., Rose, K., J. Appl. Phys. (To be published, Nov. 1981).Google Scholar