Hostname: page-component-76fb5796d-22dnz Total loading time: 0 Render date: 2024-04-26T00:30:25.739Z Has data issue: false hasContentIssue false
  • English
  • Français

X-ray scattering studies of low-T Ag(001) and Cu(001) homoepitaxy: Vacancy trapping and surface morphology evolution

Published online by Cambridge University Press:  11 February 2011

Cristian E. Botez ,
Kaile Li ,
Erdong D. Lu ,
Paul F. Miceli ,
Edward H. Conrad  and
Peter W. Stephens
Cristian E. Botez
Affiliation:
Department of Physics and Astronomy, University of Missouri-Columbia, Columbia, MO 65211, U.S.A. Department of Physics and Astronomy, State University of New York, Stony Brook, NY 11794, U.S.A.
Kaile Li
Affiliation:
Department of Physics and Astronomy, University of Missouri-Columbia, Columbia, MO 65211, U.S.A.
Erdong D. Lu
Affiliation:
Department of Physics and Astronomy, University of Missouri-Columbia, Columbia, MO 65211, U.S.A.
Paul F. Miceli
Affiliation:
Department of Physics and Astronomy, University of Missouri-Columbia, Columbia, MO 65211, U.S.A.
Edward H. Conrad
Affiliation:
School of Physics, Georgia Institute of Technology, Atlanta, GA, 30332–0430
Peter W. Stephens
Affiliation:
Department of Physics and Astronomy, State University of New York, Stony Brook, NY 11794, U.S.A.
Get access

Abstract

We have used synchrotron x-ray diffraction to study the low-T homoepitaxial growth on Ag(001) and Cu(001) surfaces. For both systems, we found that a large, temperature-dependent vacancy concentration is incorporated in films grown below 160K. The vacancy trapping occurs concomitantly with substantial changes in the surface morphology, where a non-monotonic temperature dependence of the mean-square surface roughness has been previously observed. For Cu/Cu(001) we also found that the concentration of vacancies incorporated at 110K evolves, upon heating, according to the vacancy annealing behavior well-known from radiation damage studies of bulk copper and it is consistent with the activation energy for vacancy mobility.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 749: Symposium W – Morphological and Compositional Evolution of Thin Films , 2002 , W8.1
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERNCES

1. Caspersen, K.J., Stoldt, C.R., Layson, A.R., Bartelt, M.C., Thiel, P.A. and Evans, J.W., Phys. Rev. B 63, 085401(2001).Google Scholar
2. Botez, C.E., Elliott, W.C., Miceli, P.F. and Stephens, P.W., Phys. Rev. B 66, 075418(2002).Google Scholar
3. Botez, C.E., Elliott, W.C., Miceli, P.F. and Stephens, P.W., Phys. Rev. B 64, 125427(2001).Google Scholar
4. Botez, C.E., Miceli, P.F. and Stephens, P.W., Phys. Rev. B 66, 195413(2002).Google Scholar
5. Evans, J.W., Sanders, D. E., Thiel, P. A., and DePristo, A. E., Phys. Rev. B. 41, 5410 (1990).Google Scholar
6. Ernst, H.-J., Fabre, F., Fokerts, R. and Lapujoulade, J., Phys. Rev. Lett. 72, 112(1994).Google Scholar
7. Balluffi, R. W., J. Nuc. Materials 69–70, 240 (1978).Google Scholar
8. Ehrhart, , Robrock, K.H. and Schober, H.R. in Physics of Radiation Effects in Crystals, edited by Johnson, R.A. and Orlov, A.N., (Elsevier Science Publishing B.V., 1986) pp. 60.Google Scholar