Hostname: page-component-848d4c4894-pftt2 Total loading time: 0 Render date: 2024-05-14T22:06:58.426Z Has data issue: false hasContentIssue false

On the Investigation of Power and Reliability Performance of Pseudomorphic AlGaAs/InGaAs HEMT's

Published online by Cambridge University Press:  10 February 2011

G.P. Li
Affiliation:
Department of Electrical and Computer Engineering, University of California, Irvine, CA. 92717
Y.C. Chou
Affiliation:
Department of Electrical and Computer Engineering, University of California, Irvine, CA. 92717
Y.C. Chen
Affiliation:
Microelectronics Division, Hughes Aircraft Company, Torrance, CA 90505
C.S. Wu
Affiliation:
Microelectronics Division, Hughes Aircraft Company, Torrance, CA 90505
K.K. Yu
Affiliation:
Microelectronics Division, Hughes Aircraft Company, Torrance, CA 90505
T.A. Midford
Affiliation:
Microelectronics Division, Hughes Aircraft Company, Torrance, CA 90505
Y. Liu
Affiliation:
Department of Electrical and Computer Engineering and Beckman Laser Institute and Medical Clinic, University of California, Irvine, CA. 92717
G.J. Sonek
Affiliation:
Department of Electrical and Computer Engineering and Beckman Laser Institute and Medical Clinic, University of California, Irvine, CA. 92717
X. Wei
Affiliation:
Department of Physiology and Biophysics, and Beckman Laser Institute and Medical Clinic, University of California, Irvine, CA. 92717
B.J. Tromberg
Affiliation:
Department of Physiology and Biophysics, and Beckman Laser Institute and Medical Clinic, University of California, Irvine, CA. 92717
Get access

Abstract

In this work, power and reliability performance of pseudomorphic AIGaAs/InGaAs HEMT's are investigated by 2-D device simulation, spatially-resolved electro-luminescence, light emission spectra analysis, and gate current instabilities. A two-dimensional device simulation was used to exploit the off/on state breakdown origins in the power PHEMT's and to explore the physical mechanisms responsible for light emission in both conditions. A correlation between simulated results and light emission spectra highlights the breakdown origins in PHEMT's.

PHEMT's subjected to off-state breakdown stress and on-state hot carrier stress show changes in device characteristics. While gate leakage current, i.e. a surface leakage component associated with the surface passivation layer is reduced by these stresses, a reduction in drain current, transconductance degradation, and an increase in the impact ionization generated gate current are also observed.

Further improvement in off/on state breakdown voltages and device reliability calls for device structure optimization for lower electric field design, surface passivation treatment for lower surface leakage current, and Schottky barrier enhancement for lower gate current.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Chelouche, M. and Plattner, A., Electronics & Communication Engineering Journal., 5, 187(1993).Google Scholar
2. Yoshimasu, T., Tanba, N. and Hara, S., IEEE Microwave and Guided Wave Lett., 4, 65(1994).Google Scholar
3. Merour, J.M., 23rd European Microwave Conference Proceedings, 1993, p94 Google Scholar
4. Shigaki, M., Koike, S., Nogatomo, K. and Kobayashi, K., IEEE Trans. Microwave Theory Tech., 40, 1215(1992).Google Scholar
5. Descamps, P., Pauker, V. and Vindevoghel, JJ., 21st European Microwave Conference Proceedings, 1991, p483 Google Scholar
6. Lane, P.M., Darwazeh, I.Z., Moreira, P.M.R.S. and O'Reilly, J.J., SPIE Proceedings, 1974, 57(1993).Google Scholar
7. Gaquiere, C., Theron, D., Bonte, B. and Crosnier, Y., Microwave Optical Tech. Lett., 7, 871(1994).Google Scholar
8. Wu, C.S., Ran, F., Pearton, S.J., Hu, M., Pao, C.K. and Wang, R.F., IEEE Trans. Electron Devices, 42, 1419(1995).Google Scholar
9. Wu, C.S., Yu, K.K., Hu, M. and Kanber, H., J. Electron Mat., 19, 1265(1990).Google Scholar
10. Ren, F., Pearton, S.J., Abernathy, C.R., Wu, C.S., Hu, M., Pao, C.K., Wang, D.C. and Wen, C.P., IEEE Trans. Electron Devices, 39, 2701(1992).Google Scholar
11. Chen, Y.C., Wu, C.S., Pao, C.K., Cole, M., Bardai, Z., Hou, L.D. and Midford, T.A., IEEE GaAs IC Symposium Tech. Digest, 1995, p281.Google Scholar
12. Chou, Y.C., Li, G.P., Chen, Y.C., Wu, C.S., Midford, T.A., Yu, K.K. and Cisco, TiC., in GaAs Reliability Workshop Tech. Digest, 1995.Google Scholar
13. Hikosaka, K., Hirachi, Y. and Abe, M., IEEE Trans. Electron Devices, 33, 583(1986).Google Scholar
14. Wemple, S.H., Niehausm, W.C., Cox, H.M., Dilorenzo, J.M. and Schlosser, W.O., IEEE Trans. Electron Devices, 27, 1013(1980).Google Scholar
15. Chou, Y.C., Li, G.P., Chen, Y.C., Wu, C.S., Yu, K.K. and Midford, T.A., to be submitted,Google Scholar
16. Chou, Y.C., Li, G.P., Chen, Y.C., Wu, C.S., Yu, K.K. and Midford, T.A., to be submitted.Google Scholar
17. Yamamoto, R., Higashisaka, A. and Hasegawa, F., IEEE Trans. Electron Devices, 25, 1567(1978).Google Scholar
18. Chou, Y.C., Li, G.P., Chen, Y.C., Wu, C.S., Yu, K.K. and Midford, T.A., to be published.Google Scholar
19. Tedesco, C., Zanoli, E., Canali, C., Bigliardi, S., Manfredi, M., Streit, D.C. and Anderson, W.T., IEEE Trans. Electron Devices, 40, 1211(1993).Google Scholar
20. Chou, Y.C., Li, G.P., Chen, Y.C., Wu, C.S., Yu, K.K. and Midford, T.A., to be submittedGoogle Scholar
21. Chou, Y.C., Li, G.P., Chen, Y.C., Wu, C.S., Yu, K.K. and Midford, T.A., submitted to IEEE Electron Device Lett., 1996.Google Scholar
22. Chou, Y.C., Li, G.P., Chen, Y.C., Wu, C.S., Yu, K.K. and Midford, T.A., to be published.Google Scholar