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Plasma Grafit Polymerized Styrene as an Electron-beam Resist

Published online by Cambridge University Press:  10 February 2011

Shinzo Morita ,
Shinji Ogawa ,
Mikinori Suzuki  and
Md. Abul Kashem
Shinzo Morita
Affiliation:
Department of Electrical Engineering and Electronics and Information Electronics, Nagoya University, Nagoya 464-8603, JAPAN
Shinji Ogawa
Affiliation:
Department of Electrical Engineering and Electronics and Information Electronics, Nagoya University, Nagoya 464-8603, JAPAN
Mikinori Suzuki
Affiliation:
Department of Electrical Engineering and Electronics and Information Electronics, Nagoya University, Nagoya 464-8603, JAPAN
Md. Abul Kashem
Affiliation:
Department of Electrical Engineering and Electronics and Information Electronics, Nagoya University, Nagoya 464-8603, JAPAN
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Abstract

Plasma graft polymerized styrene was formed by a reactor with a parallel plate electrode system on a pulsed plasma polymerized styrene film in a monomer vapor, where the pulsed plasma polymerization was performed by a low frequency 100%pulse modulation of 13.56 MHz power source in styrene vapor. The pulse duration was varied in the range of 0.01∼1 sec and ON time/duty cycle ratio was 1/10 and 1/20. The processes were monitored by a quartz crystal microbalance. The initial stage of plasma polymerization and grafting are discussed in this paper. Also sub 100 nm lines and spaces pattern on the resist delineated by an electron-beam pattering machine was developed by hexane.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 544: Symposium Y – Plasma Deposition and Treatment of Polymers , 1998 , 141
Copyright
Copyright © Materials Research Society 1999

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