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Diagnostics for Process Plasmas

Published online by Cambridge University Press:  21 February 2011

H. F. Dylla  and
D. M. Manos
H. F. Dylla
Affiliation:
Plasma Physics Laboratory, Princeton University Princeton, NJ 08544 USA
D. M. Manos
Affiliation:
Plasma Physics Laboratory, Princeton University Princeton, NJ 08544 USA
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Abstract

This paper reviews the current state-of-the-art of several diagnostic techniques for characterizing, monitoring, and optimizing the properties of process plasmas. The plasma parameters of plasma configurations which are useful for materials processing, such as dc and rf glow discharges, are similar to the parameters of the boundary plasmas in magnetic fusion devices. As a result, much of the large development effort over the last decade on plasma diagnostics for boundary plasmas has direct application in process plasma systems. As particular examples, the authors discuss recent developments of: (1) electrostatic probes for electron density, temperature and power flow measurements; (2) laser fluorescence spectroscopy for ion density and flux measurements; and (3) quantitative plasma mass spectroscopy using quadrupole mass filters.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 38: Symposium F – Plasma Synthesis and Etching of Electronic Materials , 1984 , 3
Copyright
Copyright © Materials Research Society 1985

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