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Design and Synthesis of a 33-Layer Narrow Bandpass Filter with Graded Refractive Index Profiles

Published online by Cambridge University Press:  10 February 2011

X. Wang ,
H. Masumoto ,
L. Chen ,
T. Hirai  and
Y. Someno
X. Wang
Affiliation:
Tohoku University, Institute for Materials Research, Sendai, JAPAN, wxr@imr.tohoku.ac.jp
H. Masumoto
Affiliation:
Tohoku University, Institute for Materials Research, Sendai, JAPAN, wxr@imr.tohoku.ac.jp
L. Chen
Affiliation:
Tohoku University, Institute for Materials Research, Sendai, JAPAN, wxr@imr.tohoku.ac.jp
T. Hirai
Affiliation:
Tohoku University, Institute for Materials Research, Sendai, JAPAN, wxr@imr.tohoku.ac.jp
Y. Someno
Affiliation:
ALPS Electric Co. Ltd., Mechatronic Devices Division 1, Kakuda, Miyagi, JAPAN.
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Abstract

A novel bandp ass filter consisting of graded refractive index profiles and a three-cavity stack was designed. It exhibits good optical characteristics, i.e., high transmittance (>99%) at the designated wavelength of 1550±25 nm and high reflectance (>99%) in wavelength regions of 1400±50 nm and 1780±100 nm. This designed 33-layer TiO2-SiO2 film with graded refractive index profiles was prepared by helicon plasma sputtering. The measured transmittance spectrum exhibited good agreement with the designed spectrum. The microstructure of this multilay er film was investigated using electron microscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 597: Symposium PP – Thin Films for Optical Waveguide Devices & Materials … , 1999 , 63
Copyright
Copyright © Materials Research Society 2000

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