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Excimer Laser Induced Crystallization of Amorphous Silicon-Germanium Films

Published online by Cambridge University Press:  15 February 2011

A. Slaoui ,
C. Deng ,
S. Talwar ,
J. K. Kramer ,
B. Prevot  and
T. W. Sigmon
A. Slaoui
Affiliation:
Electrical Engineering and Applied Physics Dept.,Oregon Graduate Institute 20000 N.W. Walker Road, Portland, OR-97291–1000
C. Deng
Affiliation:
Electrical Engineering and Applied Physics Dept.,Oregon Graduate Institute 20000 N.W. Walker Road, Portland, OR-97291–1000
S. Talwar
Affiliation:
Stanford Electronics Laboratories, Stanford University, Stanford, CA-94305
J. K. Kramer
Affiliation:
Stanford Electronics Laboratories, Stanford University, Stanford, CA-94305
B. Prevot
Affiliation:
Laboratoire GRPM-PHASE,23 rue du Loess, F-67037 Strasbourg, France
T. W. Sigmon
Affiliation:
Electrical Engineering and Applied Physics Dept.,Oregon Graduate Institute 20000 N.W. Walker Road, Portland, OR-97291–1000
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Abstract

Application of excimer laser crystallization of Amorphous silicon (a-Si) has introduced a new, interesting potential technology for the fabrication of polycrystalline (poly-Si) thin film transistors. We are currently studying polycrystalline Si1−xGex thin films in order to determine whether this material can lead to improved electrical properties or to better processing requirements when compared with polycrystalline Si films. In this work we analyze by RBS, TEM, Raman spectroscopy and surface reflectance, the structure of thin Amorphous Si1−xGex films after irradiation with a XeCl excimer laser. The Amorphous SiGe films were prepared by evaporation of Si and Ge onto oxidized Si substrates using an electron gun in vaccum. The effects of laser energy fluence during irradiation are investigated. The Amorphous to crystalline transition is followed by in-situ measurement of time-resolved reflectivity.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 321: Symposium E – Crystallization and Related Phenomena in Amorphous Materials—Ceramics, Metals, Polymers, and Semiconductors , 1993 , 689
Copyright
Copyright © Materials Research Society 1994

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References

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