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Photonic Crystals Based onMacroporous Silicon

Published online by Cambridge University Press:  10 February 2011

V. Lehmann
Affiliation:
Siemens AG, Dept. ZT ME 1, 81730 München, Germany
U. Grüning
Affiliation:
Siemens AG, Dept. ZT ME 1, 81730 München, Germany
A. Birner
Affiliation:
MPI für Mikrostrukturphysik, Am Weinberg 2, 01620 Halle, Germany
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Abstract

The formation of macropore arrays with high aspect ratios by electrochemical etching of n-type silicon in hydrofluoric acid is a well established technique. By using standard photolithograpy the geometry of the array can be controlled with high precision. This enables us to fabricate twodimensional photonic crystals for the infrared regime. The calculated photonic band structure of the crystal corresponds well with the transmission observed experimentally. Furthermore first defect structures like waveguides and cavities have been realized.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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