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Formation of Single-atom-thick Copper Oxide Monolayers

Published online by Cambridge University Press:  04 August 2017

Kuibo Yin
Affiliation:
SEU-FEI Nano-Pico Center, Key Lab of MEMS of Ministry of Education, Southeast University, Nanjing 210096, China Materials Science & Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
Yu-Yang Zhang
Affiliation:
Materials Science & Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA Department of Physics and Astronomy and Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN 37235, USA
Yilong Zhou
Affiliation:
SEU-FEI Nano-Pico Center, Key Lab of MEMS of Ministry of Education, Southeast University, Nanjing 210096, China
Litao Sun
Affiliation:
SEU-FEI Nano-Pico Center, Key Lab of MEMS of Ministry of Education, Southeast University, Nanjing 210096, China Center for Advanced Materials and Manufacture, Joint Research Institute of Southeast University and Monash University, Suzhou 215123, China
Matthew F. Chisholm
Affiliation:
Materials Science & Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
Sokrates T. Pantelides
Affiliation:
Materials Science & Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA Department of Physics and Astronomy and Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN 37235, USA
Wu Zhou
Affiliation:
Materials Science & Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2017 

References

[1] Zhang, Y., Chang, T.-R., Zhou, B., Cui, Y.-T., Yan, H., Liu, Z., Schmitt, F., Lee, J., Moore, R., Chen, Y., Lin, H., Jeng, H.-T., Mo, S.-K., Hussain, Z., Bansil, A. & Shen, Z.-X. Nat Nano 2014 9, 111115.Google Scholar
[2] Ma, R. & Sasaki, T. Advanced Materials 2010 22, 50825104.Google Scholar
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[4] Gao, S., Sun, Y., Lei, F., Liu, J., Liang, L., Li, T., Pan, B., Zhou, J. & Xie, Y. Nano Energy 2014 8, 205213.Google Scholar
[5] We thank Junhao Lin, Qian He, Miaofang Chi, Juan-Carlos Idrobo, and Andrew Lupini for useful discussions.Google Scholar