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Modified Linear Transmission Line Model Test Structure for Determining Specific Contact Resistance

Published online by Cambridge University Press:  01 February 2016

G.K. Reeves ,
Y. Pan ,
P.W. Leech  and
A.S. Holland
G.K. Reeves
Affiliation:
School of Electrical and Computer Engineering, RMIT University, GPO Box 2476V, Melbourne, Victoria, 3001, Australia
Y. Pan
Affiliation:
School of Electrical and Computer Engineering, RMIT University, GPO Box 2476V, Melbourne, Victoria, 3001, Australia
P.W. Leech*
Affiliation:
School of Electrical and Computer Engineering, RMIT University, GPO Box 2476V, Melbourne, Victoria, 3001, Australia
A.S. Holland
Affiliation:
School of Electrical and Computer Engineering, RMIT University, GPO Box 2476V, Melbourne, Victoria, 3001, Australia
*
*(Email: Patrick.Leech@rmit.edu.au)
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Abstract

A modified design of the transmission line model test structure uses the simple calculation of specific contact resistance, ρc, based on a two contact linear pattern but without the requirement of a mesa etch. This modified structure uses a linear TLM with semicircular terminations at each end. The function of the semicircular terminations is to confine the fringing fields at the ends of the linear TLM contacts. Simple analytical equations for determining ρc have been developed on the basis of the modified linear TLM pattern. These calculations have shown good agreement with a finite element model (FEM) of the modified TLM test structure using typical parameters for metal/ SiC contacts.

Keywords

electronic materialelectrical propertieselectronic structure
Type
Articles
Information
MRS Advances , Volume 1 , Issue 2: Energy and Sustainability , 2016 , pp. 157 - 162
Copyright
Copyright © Materials Research Society 2016 

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References

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