Hostname: page-component-76fb5796d-2lccl Total loading time: 0 Render date: 2024-04-26T15:07:20.300Z Has data issue: false hasContentIssue false
  • English
  • Français

Theoretical Prediction of the Effect of Coil Configuration on Gas Mixing in an Inductively Coupled Plasma Torch

Published online by Cambridge University Press:  25 February 2011

John W. Mckelliget  and
Nagy El-Kaddah
John W. Mckelliget
Affiliation:
University of Lowell, Dept. of Mechanical and Energy Engineering, Lowell, MA 01854
Nagy El-Kaddah
Affiliation:
University of Alabama, Dept. of Metallurgical Engineering, Tuscaloosa, AL 35486
Get access

Abstract

A mathematical model for the analysis and design of inductively coupled plasma torches Is presented. The model is based upon a solution of the electromagnetic vector potential equation and is capable of predicting the two-dimensional velocity, temperature, and electromagnetic fields as well as the reaction kinetics inside the torch for any axi-symmetric coil configuration. The model is used to study the effect of coil geometry on the thermal decomposition of silicon tetrachloride to silicon. The coil geometry Is found to affect both the temperature field and the flow field and to have a significant effect on the reaction kinetics in the torch. It is demonstrated that through fundamental changes in the coil design It is possible to control the location of the reaction zone and to prevent silicon deposition on the wall of the reactor.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 98: Symposium K – Plasma Processing and Synthesis of Materials II , 1987 , 21
Copyright
Copyright © Materials Research Society 1987

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. National Materials Advisory Board, ‘Plasma Processing of Materials’, Report #NMAB-415, (1985).Google Scholar
2. Vogt, G.J., Hollabaugh, C., Hull, D., Newkirk, L., Petrovic, J., M.R.S. Symposium on Plasma Processing and Synthesis of Materials, Ed. Szekely, J., and Apelian, D., 30, 283, (1984).Google Scholar
3. Yoshida, T., Endo, H., Saito, K., Akashi, K., Proc. 6th Int. Symp. on Plasma Chem., 1, 225, (1983).Google Scholar
4. Meyer, J.L., El-Kaddah, N., Szekely, J., IEEE Trans. Magn., (1987), In Press.Google Scholar
5. Vurzel, F.B., Polak, L.S., Khim. Vys. Energ., 1, 268, (1967).Google Scholar
6. Yoshida, T., Nakagawa, K., Harada, T., Akashi, K., Plasma Chem. and Plasma Processing, 1, 113–129, (1981).Google Scholar
7. Marynowski, C. W., Monroe, A.G., in ‘High Temperature Technology', p. 67, Butterworth and Co., Washington, (1964)Google Scholar