Hostname: page-component-76fb5796d-r6qrq Total loading time: 0 Render date: 2024-04-26T10:37:57.462Z Has data issue: false hasContentIssue false
  • English
  • Français

Evolution of Structural and Optical Properties on PIN and NIP pm-Si:H Devices During 400 Hrs of Light-Soaking

Published online by Cambridge University Press:  16 June 2015

Leon Hamui ,
Pere Roca i Cabarrocas  and
Guillermo Santana
Leon Hamui
Affiliation:
Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México. A.P. 70-360, Coyoacán, C.P. 04510, México, D.F.
Pere Roca i Cabarrocas
Affiliation:
Laboratoire de Physique des Interfaces et des Couches Minces, CNRS, Ecole Polytechnique, 91128 Palaiseau, France
Guillermo Santana
Affiliation:
Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México. A.P. 70-360, Coyoacán, C.P. 04510, México, D.F.
Get access

Abstract

Pm-Si:H PIN and NIP solar cells structures grown using plasma enhanced chemical vapor deposition (PECVD) technique were analyzed during 400 hrs of light-soaking exposition. The evolution of the structural and optical properties was observed and characterized by Raman spectroscopy, spectroscopic ellipsometry. The effect observed is related to defects creation due to induced hydrogen diffusion, break of Si-H bonds and the generation of dangling bonds that causes less passivated films. The film microstructure, and therefore the optical properties varied with the exposition time. The crystalline fraction of these structures presents a slight decrease and it is observed to be between 15 to 24% for the PIN and 5 to 10% for the NIP. The optical gap increases from 1.66 to 1.68 eV for the PIN structure while for the NIP no significant change is observed during light-soaking. Hydrogen diffusion during lights soaking generates a decrease on the absorption properties of the films which in turn is expected to reduce the device efficiency during operation. In this work we show that long range motion of hydrogen during light-soaking causes a hydrogen rearrangement on the film and microstructure changes. We determined that there is not an pronounced change on the film structure during prolonged light exposition related to the stability of the pm-Si:H films. The PIN structure properties are more affected during light soaking in comparison to the NIP structure which is expected to cause less degradation of its optoelectronic properties under illumination, and a more stable device during operation.

Keywords

Raman spectroscopyradiation effectsSi
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1792: Symposium CC/FF – Defects and Materials Issues in Semiconductors―Relationship to Optoelectronic Properties and Device Reliability , 2015 , mrss15-2138457
Copyright
Copyright © Materials Research Society 2015 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Butté, R., Vignoli, S., Meaudre, M., Meaudre, R., Marty, O., Saviot, L. and Roca i Cabarrocas, P., J. Non-Cryst. Solids 266-269, 263–268 (2000).CrossRefGoogle Scholar
Soro, M.Y., Gueunier-Farret, M.E. and Kleider, J.P., J. Appl. Phys. 109, 023713 (2011).CrossRefGoogle Scholar
Sopori, B.L., Deng, X., Benner, J.P., Rohatgi, A., Sana, P., Estreicher, S.K., Park, Y.K. and Roberson, M.A., Solar Ener. Mater. & Solar Cells 41-42, 159–169 (1996).CrossRefGoogle Scholar
Staebler, D.L. and Wronski, C.R., Appl. Phys. Lett. 31, 292–294 (1977)CrossRefGoogle Scholar
Baek, S., Iftiquar, S.M., Jang, J., Lee, S., Kim, M., , Jung, J, Park, H., Park, J., Kim, Y., Shin, C., Lee, Y.J. and Yi, J., Applied Surface Science 260, 17–22 (2012).CrossRefGoogle Scholar
Kail, F., Fellah, S., Abramov, A., Hadjadj, A. and Roca i Cabarrocas, P., Journal of Non-Crystalline Solids 352, 1083–1086 (2006).CrossRefGoogle Scholar
Yamasaki, S., Das, U.K. and Yasuda, T., Journal of Non-Crystalline Solids 299-302, 185–190 (2002).CrossRefGoogle Scholar
Kim, K.H., Johnson, E.V. and Roca i Cabarrocas, P., Solar Ener. Mater. & Solar Cells, 105, 208–212 (2012)CrossRefGoogle Scholar
Pham, N., Hadjadj, A., Roca i Cabarrocas, P., Jbara, O. and Kail, F., Thin Solid Films 517, 6225–6229 (2009).CrossRefGoogle Scholar
Roca i Cabarrocas, P., Chevrier, J.B., Huc, J., Lloret, A., Parey, J.Y. and Schmitt, J.P.M., Journal of Vacuum Science and Technology A9, 2331–2341 (1991).CrossRefGoogle Scholar
Kim, K.H., Johnson, E.V., Abramov, A. and Roca i Cabarrocas, P., EPJ Photovolt 3, 30301 (2012).CrossRefGoogle Scholar
Fontcuberta i Morral, A., Clerc, C. and Roca i Cabarrocas, P., Phys. Rev. B 69, 125307 (2004).CrossRefGoogle Scholar
Kail, F., Hadjadj, A. and Roca i Cabarrocas, P., Thin Solid Films 487, 126– 131 (2005).CrossRefGoogle Scholar
Smeets, D., Johnson, B.C., McCallum, J.C. and Comrie, C.M., Nucl. Instr. Meth. Phys. Res. B 269, 2657–2661 (2011).CrossRefGoogle Scholar
Johnson, B.C., McCallum, J.C., Atanacio, A.J. and Prince, K.E., Appl. Phys. Lett. 95 101911 (2009).CrossRefGoogle Scholar