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Microstructure and Stress in Mo Films Sputttr-Deposited on Glass Substrates

Published online by Cambridge University Press:  15 February 2011

Tsang-Shaw Lee ,
Gin-Lern Gu  and
Bae-Heng Tseng
Tsang-Shaw Lee
Affiliation:
Institute of Materials Science and Engineering, National Sun Yat-Sen University, Kaohsiung 80424, TAIWAN-R.O.C.
Gin-Lern Gu
Affiliation:
Institute of Materials Science and Engineering, National Sun Yat-Sen University, Kaohsiung 80424, TAIWAN-R.O.C.
Bae-Heng Tseng
Affiliation:
Institute of Materials Science and Engineering, National Sun Yat-Sen University, Kaohsiung 80424, TAIWAN-R.O.C.
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Abstract

Mo films are deposited on various glass substrates using the sputtering technique. The film stress and texture are greatly affected by the substrate materials. For the films grown on borosilicate glass both DC and RF sputtering may produce films with desirable properties. However, the films with compressive stress can be deposited on sodalime glass substrates only by RF sputtering. Preferred orientations are (211) and (110) for the film grown on borosilicate glass substrate and the film grown on sodalime glass substrate, respectively.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 403: Symposium I – Polycrystalline Thin Films: Structure, Texture, Properties and Applications II , 1995 , 119
Copyright
Copyright © Materials Research Society 1996

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