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Laser-Induced Chemical Vapor Deposition of High Purity Aluminum

Published online by Cambridge University Press:  25 February 2011

Thomas H. Baum ,
Carl E. Larson  and
Robert L. Jackson
Thomas H. Baum
Affiliation:
IBM Almaden Research Center, San Jose, California 95120–6099
Carl E. Larson
Affiliation:
IBM Almaden Research Center, San Jose, California 95120–6099
Robert L. Jackson
Affiliation:
IBM Almaden Research Center, San Jose, California 95120–6099
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Abstract

The laser-induced chemical vapor deposition (LCVD) of aluminum metal has been achieved via the pyrolytic decomposition of trimethylamine aluminum hydride (TMAAH). This material is a volatile, crystalline solid which is non-pyrophoric, in contrast to many other aluminum precursors. Laser-driven pyrolysis of TMAAH enables the selective deposition of high purity, highly conducting aluminum deposits. The volatility of the TMAAH precursor is directly responsible for the rapid rates of aluminum deposition and permits rapid scan velocities to be utilized. The relationship between the chemical structure of TMAAH and the high purity of the aluminum deposits is described.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 129: Symposium B – Laser and Particle-Beam Modification of Chemical Processes on Surfaces , 1988 , 119
Copyright
Copyright © Materials Research Society 1989

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References

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