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Atomic Force and Electron Microscopy Studies of Tin Dioxide Films Prepared from Solutions with High Fluorine Content

Published online by Cambridge University Press:  21 March 2011

Dwight R. Acosta
Affiliation:
Instituto de Física, UNAM, A.P. 20-364; 01000 México D.F., MEXICO
Rebeca Castanedo
Affiliation:
Inst. Politécnico Nacional; Lab. de Materiales, Querétaro, MEXICO
Walter Estrada
Affiliation:
Univ. Nacional de higeniería, Fac. de Ciencias, Lima, PERU
Rosario Avila-Godoy
Affiliation:
Univ. de Los Andes, Fac. de Ciencias, Mérida, VENEZUELA
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Abstract

Atomic force microscopy and electron microscopy were used to study surface and structural properties in SnO2:F thin films deposited by spray pyrolysis on glass at a constant substrate temperature. The influence of high levels of fluorine in the starting solution on the surface topology and morphology of thin films and correlations with electrical properties are presented in this work.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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