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Surface structure and composition of nanocrystalline SnO2 thin films obtained by Chemical Vapor Deposition

Published online by Cambridge University Press:  15 March 2011

Davide Barreca ,
Elza Bontempi ,
Laura E. Depero ,
Cinzia Maragno  and
Eugenio Tondello
Davide Barreca
Affiliation:
ISTM-CNR and INSTM - Department of Chemical Sciences - Padova University- Via Marzolo, 1 - 35131 Padova, Italy
Elza Bontempi
Affiliation:
INFM and Structural Chemistry Laboratory – Department of Mechanical Engineering - Brescia University- Via Branze, 38 – 25123 Brescia, Italy
Laura E. Depero
Affiliation:
INFM and Structural Chemistry Laboratory – Department of Mechanical Engineering - Brescia University- Via Branze, 38 – 25123 Brescia, Italy
Cinzia Maragno
Affiliation:
Department of Chemical Sciences and INSTM - Padova University - Via Marzolo, 1 – 35131 Padova, Italy
Eugenio Tondello
Affiliation:
Department of Chemical Sciences and INSTM - Padova University - Via Marzolo, 1 – 35131 Padova, Italy
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Abstract

Nanocrystalline SnO2 thin films were synthesized by Chemical Vapor Deposition on Si(100) and Al2O3 substrates using bis(diethylamino)dimethylstannane(IV) [(CH3)2Sn(N(C2H5)2)2] as precursor. Film growth was performed at 400-500°C in an O2(H2O)+N2 atmosphere, with the aim of studying the effects of the synthesis conditions on the coating properties. The sample chemical composition and surface morphology were analyzed by X-ray Photoelectron Spectroscopy (XPS) and Atomic Force Microscopy (AFM), while their structural features were investigated by Glancing Incidence X-ray Diffraction (GIXRD) and X-ray Reflectivity (XRR). In this paper, the attention is focused on the interplay between film nanostructure and morphology, with particular regard to the influence of the growth surface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 822: Symposium S – Nanostructured Materials in Alternative Energy Devices , 2004 , S7.8
Copyright
Copyright © Materials Research Society 2004

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References

1. Waal, H. De and Simonis, F., Thin Solid Films 77, 253 (1981).Google Scholar
2. Manifacier, J. C., Thin Solid Films 90, 297 (1982).Google Scholar
3. Jin, Z., Zhou, H. J., Jin, Z. L., Savinell, R. F. and Liu, C. C., Sens. Actuators, B 52, 188 (1998).Google Scholar
4. Varghese, O. K., Mahlotra, L. K. and Sharma, G. L., Sens. Actuators, B 55, 161 (1999).Google Scholar
5. Acciarri, M., Canevali, C., Mari, C. M., Mattoni, M., Ruffo, R., Scotti, R., Morazzoni, F., Barreca, D., Armelao, L., Tondello, E., Bontempi, E. and Depero, L. E., Chem. Mater. 15, 2646 (2003) and References therein.Google Scholar
6. Takahata, K., in Chemical Sensors Technology, Seiyama, T. (Kodansha, Tokyo, and Elsevier, Amsterdam, 1988).Google Scholar
7. Shimizu, Y. and Egashira, M., MRS Bull. 24, 18 (1999) and References therein.Google Scholar
8. Sangaletti, L., Depero, L. E., Allieri, B., Pioselli, F., Comini, E., Sberveglieri, G. and Zocchi, M., J. Mater. Res. 13, 2457 (1998) and References therein.Google Scholar
9. Barreca, D., Garon, S., Tondello, E. and Zanella, P., J. Phys. IV 9, 667 (1999).Google Scholar
10. Topas, P, copyright Bruker AXS Version 1.0.1 (1999).Google Scholar
11. Bontempi, E., PhD Thesis (University of Brescia, Italy, 2000).Google Scholar
12. Moulder, J. F., Stickle, W. F., Sobol, P. W., Bomben, K. D., Handbook of X-ray Photoelectron Spectroscopy, Perkin Elmer, Physical Electronics Division (Eden Prairie, MN, USA, 1992).Google Scholar
13. Barreca, D., Garon, S., Tondello, E. and Zanella, P., Surf. Sci. Spectra 7, 81 (2000).Google Scholar
14. Briggs, D., Seah, M. P., in Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy, J. Wiley & Sons (Chichester, UK, 1988).Google Scholar
15. Poirier, G. E., Cavicchi, R. E. and Semancik, S. J., J. Vac. Sci. Technol., A 12, 2149 (1994).Google Scholar
16. Morazzoni, F., Canevali, C., Chiodini, N., Mari, C., Ruffo, R., Scotti, R., Armelao, L., Tondello, E., Depero, L. E. and Bontempi, E., Mater. Sci. Eng., C 15, 167 (2001).Google Scholar
17. Yamazoe, N. and Miura, N., in Chemical Sensor Technology, Yamauchi, S. (Elsevier, New York, 1992), Vol. 4, p. 19.Google Scholar