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Ambient Temperature Synthesis of Bulk Intermetallics

Published online by Cambridge University Press:  15 February 2011

M. Ratzker
Affiliation:
American Dental Association Health Foundation, Paffenbarger Research Center
D. S. Lashmore
Affiliation:
Materials Science and Engineering Laboratory, Metallurgy Division National Institute of Standards and Technology, Gaithersburg MD, 20899
M. P. Dariel
Affiliation:
Department of Materials Engineering, Ben-Gurion University of the Negev, Beer-Sheva, Israel
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Abstract

Room-temperature intermetallic compound formation occurs when one of the component metals has a very low melting point or when two metals in close contact interdiffuse very rapidly. Compound formation at room temperature at the interface of superposed thin films has been observed in several instances, often in systems relating to electronic materials. The overall amount of compound produced in such configurations, however, is limited, due to the intrinsic limitations involved in the thin layer geometry. Bulk quantities of intermetallic can be produced at ambient temperature in solids by increasing the interface area between the components that interdiffuse rapidly. This condition can be achieved by having small size powder particles of one component coated with a layer of the second component. The very large interface area leads to rapid formation of bulk quantities of compounds even at ambient temperature. By appropriate control of the initial constituents and the coating parameters, it is possible to custom-prepare various intennetallic compounds present in binary systems such as silver-tin, gold-tin and silver-indium in which fast interdiffusion takes place.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

1. Warburton, W.K. and Turnbull, D., in Diffusion in Solids. Recent Developments edited by Nowick, A.S. and Burton, J.J. ( Academic Press, New York, 1975), p.172.Google Scholar
2. Tu, K.N. and Rosenberg, R., Jap. J. Appl. Phys. Suppl. 2, Pt.1, 633 (1974);Google Scholar
Tu, K.N., Ann. Rev. Mater. Sci. 15, 147 (1985).Google Scholar
3. Lowenheim, F.A., Electroplating, (McGraw-Hill Inc., New-York, 1978), chap. 18.Google Scholar
4. Parker, E.A., in Gold Plating Technology, edited by Reid, F.H. and Goldie, W. (Electrochemical Publications Limited, Glasgow, 1974), chap. 10.Google Scholar
5. Baren, M.R., in Binary Phase Diagrams, 2nd edition, edited by Massalski, T.B. (ASM International, Materials Park, 1990), p.47.Google Scholar
6. Okamoto, H and Massalski, T.B., in Binary Alloy Phase Diagrams, edited by Massalski, T.B. (ASM International, Materials Park, 1986), p.315.Google Scholar