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Elastic Properties of Sputtered Thin Films: Influence of Different Preparation Conditions

Published online by Cambridge University Press:  15 February 2011

C.E. Bottani ,
M. Elena ,
M. Beghi ,
G. Ghislotti ,
L. Guzman ,
A. Miotello  and
P.M. Ossi
C.E. Bottani
Affiliation:
Dip. Ingegneria Nucleate, Politecnico, via Ponzio 34/3, 20133 Milano, Italy
M. Elena
Affiliation:
Istituto per la Ricerca Scientifica e Tecnologica, 38050 Povo, Italy
M. Beghi
Affiliation:
Dip. Ingegneria Nucleate, Politecnico, via Ponzio 34/3, 20133 Milano, Italy
G. Ghislotti
Affiliation:
Dip. Ingegneria Nucleate, Politecnico, via Ponzio 34/3, 20133 Milano, Italy
L. Guzman
Affiliation:
Dipartimento di Fisica dell'Università, 38050 Povo (TN), Italy
A. Miotello
Affiliation:
Dipartimento di Fisica dell'Università, 38050 Povo (TN), Italy
P.M. Ossi
Affiliation:
Dip. Ingegneria Nucleate, Politecnico, via Ponzio 34/3, 20133 Milano, Italy Unità clNFM, 38050 Povo (TN), Italy.
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Abstract

This work presents the first results of a study aimed at better understanding the elastic behaviour of hard coatings produced by various techniques. This is important also in view of the need to be able to control the level of internal stresses, particularly in PVD coatings. It is well known that in extreme cases excessive internal stress can lead to complete film destruction. We devote this paper to reactively magnetron sputtered TiN, one of the most widely used compounds. Thin TiN films of different compositions were deposited on Si substrates and characterized by SEM, AES, XRD and Brillouin light scattering.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 308: Symposium M1 – Thin Films: Stresses and Mechanical Properties IV , 1993 , 95
Copyright
Copyright © Materials Research Society 1993

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References

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