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Lateral InxGa1−x, P Heterostructures Obtained by Single Step Growth on Pre-Patterned Substrate by Chemical Beam Epitaxy

Published online by Cambridge University Press:  10 February 2011

M.P.P. de Castro
Affiliation:
Departamento de Fisica Aplicada, LPD- Universidade Estadual de Campinas- São Paulo, Brasil
J. Betitni
Affiliation:
Departamento de Fisica Aplicada, LPD- Universidade Estadual de Campinas- São Paulo, Brasil
C.A. Ribeiro
Affiliation:
Departamento de Fisica Aplicada, LPD- Universidade Estadual de Campinas- São Paulo, Brasil
M.M. Carvalho
Affiliation:
Departamento de Fisica Aplicada, LPD- Universidade Estadual de Campinas- São Paulo, Brasil
N.C. Frateschi
Affiliation:
Departamento de Fisica Aplicada, LPD- Universidade Estadual de Campinas- São Paulo, Brasil
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Abstract

We present an investigation on the spatial compositional variation in InGaP layers grown by chemical beam epitaxy (CBE) on pre-patterned substrates. Neighboring regions with 190 meV bandgap discontinuity are observed with the growth at 500°C. The development of laser structures on V-grooves that incorporate these lateral heterostructures is achieved by controlling the growth temperature during growth

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

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References

REFERENCES

[1] Scott, M.D., Riffat, J.R, Griffith, I., Davies, J.I. and Marshall, A.C., J. Crystal Growth 93, 820 (1988).Google Scholar
[2] Guha, S., Madhukar, A., Kaviani, K., Chen, L., Kapre, R., Hyugaji, M. and Xie, Z., Mat. Res. Soc. Symp. Proc. 145, 27 (1989).Google Scholar
[3] Arent, D.J., Nilsson, S., Galeuchet, Y.D., Meir, H.P. and Walter, W., Appl. Phys. Lett. 55, 2611 (1989).Google Scholar
[4] Krahl, M., Kapon, E., Schiavone, L.M., Gaag, B.P. Van der, Harbison, J.P., and Florez, L.T., Appl. Phys. Lett. 61, 813 (1992).Google Scholar
[5] Sugira, H., Nishida, T., Iga, R., Yamada, T. and Tamamura, T., J. Crystal 121, 579 (1992).Google Scholar
[6] Castro, M.P.P. de, Frateschi, N.C., Bettini, J., Carvalho, M. M. de, J. Crystal Growth 193, 510 (1998).Google Scholar
[7] Castro, M.P.P. de, Frateschi, N.C., Bettini, J., Carvalho, M. M. de, in press, J. Crystal Growth (1999).Google Scholar
[8] Ozasa, K., Yuri, M., Tanaka, S. and Matsumani, H., J. Appl. Phys. 68, 107 (1990).Google Scholar