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The Role of Nanoscale Confinement of Adhesion Promoting Molecules on the Adhesion and Resistance to Moisture Attack at the Polymer/Silicon Nitride Interface

Published online by Cambridge University Press:  01 February 2011

Bree M. Sharratt
Affiliation:
sharratt@stanford.edu, Stanford University, Aeronautics and Astronautics, 416 Escondido Mall, Bldg 550, Stanford University, Stanford, CA, 94305-2205, United States, 650-725-2634
Reinhold H. Dauskardt
Affiliation:
dauskardt@stanford.edu, Stanford University, Materials Science and Engineering, 416 Escondido Mall, Bldg 550, Stanford, CA, 94305-2205, United States
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Abstract

The interface between a highly-crosslinked polymer film and a thin silicon nitride layer can be regulated using adhesion promoting molecules. This work compares the effects of both indirect polymer/inorganic interface chemistry modification by blending organosilane adhesion promoting molecules into the polymer layer, and direct modification by confining the organosilane molecules to the substrate surface. Of particular interest are the effects of these modifications on the occurrence of an anomalous subcritical debonding phenomenon previously observed for the unmodified interface. While significantly different adhesion values were measured, the influence of the blended organosilanes was limited to moderating moisture diffusion through the polymer layer, which correllates with moderated near-threshold growth rates. Conversely, nanoscale confinement of the adhesion promoting molecules did not result in expected universal increases in adhesion energy but did inhibit anomalous near-threshold behavior.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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