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Rotating-Compensator Multichannel Ellipsometry: Applications in Process Development for Nanocrystalline Diamond Thin Films

Published online by Cambridge University Press:  10 February 2011

R. W. Collins ,
Joungchel Lee ,
P. I. Rovira  and
Ilsin An
R. W. Collins
Affiliation:
Materials Research Laboratory and Department of Physics, The Pennsylvania State University, University Park, PA 16802.
Joungchel Lee
Affiliation:
Materials Research Laboratory and Department of Physics, The Pennsylvania State University, University Park, PA 16802.
P. I. Rovira
Affiliation:
Materials Research Laboratory and Department of Physics, The Pennsylvania State University, University Park, PA 16802.
Ilsin An
Affiliation:
Department of Physics, Han Yang University, Ansan, Seoul, Korea.
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Abstract

A multichannel spectroscopic ellipsometer based on the rotating-compensator principle was developed and applied to characterize nanocrystalline diamond thin film growth processes by plasma-enhanced chemical vapor deposition (PECVD). With the newly-designed instrument, a time resolution of 32 ms is possible for spectra (1.5˜4.0 eV) in the Stokes vector of the light beam reflected from the surface of the growing film. Several advantages of the rotating-compensator over the simpler rotating-polarizer multichannel ellipsometer design are demonstrated here for diamond thin film growth. These include the ability to: (i) resolve the sign ambiguity in the p–s wave phase-shift difference Δ, (ii) obtain accurate Δ values for low ellipticity polarization states, and (iii) deduce spectra in the degree of polarization of the light beam reflected from the film/substrate. The degree of polarization has been applied to characterize the time evolution of light scattering during the nucleation of the diamond, as well as the time evolution of thickness non-uniformity over the probed area of the growing film. In this paper, a brief description of calibration and data reduction for the new instrument is also provided.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 502: Symposium II – In Situ Process Diagnostics & Intelligent Materials Processing , 1997 , 23
Copyright
Copyright © Materials Research Society 1998

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References

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