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Optimization of Fluorine Co-implantation for PMOS Source and Drain Extension Formation for 65nm Technology Node
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- Journal:
- MRS Online Proceedings Library Archive / Volume 810 / 2004
- Published online by Cambridge University Press:
- 17 March 2011, C5.8
- Print publication:
- 2004
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Demonstration of the state-of-the-art of formation and characterization of ultra-shallow junctions
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- Journal:
- MRS Online Proceedings Library Archive / Volume 669 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, J2.4
- Print publication:
- 2001
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- Article
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